Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements

Li, Zhiwei; Shao, Junming; Luo, Qian; Lei, Boping; Gao, Guohan; Bian, Jiang; Wu, Shibin; Fan, Bin

doi:10.1364/osac.2.003350

Cited by 5 publications

(4 citation statements)

References 7 publications

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“…An Reactive Ion Figuring (RIF) process with a simple and universal masking method was demonstrated. Polyimide (PI) membrane substrates have been figure-corrected by RIF to the final figure error of 17~20 nm rms in total effective figuring time of several minutes 2 > REPLACE THIS LINE WITH YOUR MANUSCRIPT ID NUMBER (DOUBLE-CLICK HERE TO EDIT) < [16], [17]. This RIF process presents the advantages of a noncontact tool combined with high material removal rate and repeatability at nanometer level, which has been proved in semiconductor industry [18].…”

Section: Methodsmentioning

confidence: 99%

Figure Correction of a Quartz Sub-Mirror for a Transmissive Diffractive Segmented Telescope by Reactive Ion Figuring

Luo

Wang

et al. 2022

IEEE Photon. Technol. Lett.

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A quartz sub-mirror was figure-corrected in a parallel removal process for the first time. An Reactive Ion Figuring (RIF) process with a simple and universal masking method was demonstrated, and the 350-mm quartz sub-mirror was figure-corrected from the initial figure error of ~23 nm RMS to the final figure error of ~8 nm RMS in total effective figuring time of ~52 minutes after 4 iterations, which exhibited the actual potential of RIF on the figure-correction of quartz optical elements and the possibility on applying RIF to meet the requirement of mass production for sub-mirrors of transmissive diffractive segmented telescopes.

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Section: Methodsmentioning

confidence: 99%

Figure Correction of a Quartz Sub-Mirror for a Transmissive Diffractive Segmented Telescope by Reactive Ion Figuring

Luo

Wang

et al. 2022

IEEE Photon. Technol. Lett.

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“…This is similar to the calculation and acquisition of dwell time in other polishing methods. In addition, unlike our previous attempts to perform reactive ion etching for fast figure-correction of transmission wave-front error on lightweight thin film diffraction elements and a quartz sub-mirror [ 25 , 30 ], an inkjet printer was used to print the UV-curable ink masking layers on the non-etching area MReg i ( x , y ) to protect the surface material. During each figuring cycle, when etching was completed, the masking layers were stripped using hydrogen peroxide, alcohol, and acetone, and the mirror was cleaned with deionized water.…”

Section: Theory and Mathematical Modelmentioning

confidence: 99%

“…In our previous research, we used this reactive ion etching technology with low temperature, high precision, and non-contact processing characteristics to process large-aperture ultra-light polyimide film substrate. A 400 mm aperture membrane substrate was figure-corrected by reactive ion etching from the initial figure error of 105 nm rms to the final figure error of ~17 nm rms [ 25 ]. This makes it possible to fabricate high-precision optical substrates of ultra-lightweight diffractive lenses.…”

Section: Introductionmentioning

confidence: 99%

Plasma Figure Correction Method Based on Multiple Distributed Material Removal Functions

et al. 2023

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In the process of plasma figure correction for a quartz sub-mirror, the plasma parallel removal process and ink masking layer are combined for the first time. A universal plasma figure correction method based on multiple distributed material removal functions is demonstrated, and its technological characteristics are analyzed. Through this method, the processing time is independent of the workpiece aperture, which saves time for the material removal function to scan along the trajectory. After seven iterations, the form error of the quartz element is converged from the initial figure error of ~114 nm RMS to a figure error of ~28 nm RMS, which shows the practical potential of the plasma figure correction method based on multiple distributed material removal functions in optical element manufacturing and the possibility of becoming a new stage process in the optical manufacturing chain.

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“…In addition, the higher plasma temperature will cause damage to the membrane substrate, and the plasma jet method is clearly not suitable for etching PI films [ 16 ]. A rapid figure correction process for PI membrane optical elements by reactive ion etching has been proposed previously [ 17 ]. However, in the full aperture range, the etching rate distribution on the membrane surface is assumed to be the same in a single processing iteration.…”

Section: Introductionmentioning

confidence: 99%

The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes

et al. 2023

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Reactive ion etching (RIE) is a promising material removal method for processing membrane diffractive optical elements and fabrication of meter-scale aperture optical substrates because of its high-efficiency parallel processing and low surface damage. However, the non-uniformity of the etching rate in the existing RIE technology will obviously reduce the machining accuracy of diffractive elements, deteriorate the diffraction efficiency and weaken the surface convergence rate of optical substrates. In the etching process of the polyimide (PI) membrane, additional electrodes were introduced for the first time to achieve the modulation of the plasma sheath properties on the same spatial surface, thus changing the etch rate distribution. Using the additional electrode, a periodic profile structure similar to the additional electrode was successfully processed on the surface of a 200-mm diameter PI membrane substrate by a single etching iteration. By combining etching experiments with plasma discharge simulations, it is demonstrated that additional electrodes can affect the material removal distribution, and the reasons for this are analyzed and discussed. This work demonstrates the feasibility of etching rate distribution modulation based on additional electrodes, and lays a foundation for realizing tailored material removal distribution and improving etching uniformity in the future.

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Highly accurate positioned, rapid figure correction by reactive ion etching for large aperture lightweight membrane optical elements

Cited by 5 publications

References 7 publications

Figure Correction of a Quartz Sub-Mirror for a Transmissive Diffractive Segmented Telescope by Reactive Ion Figuring

Figure Correction of a Quartz Sub-Mirror for a Transmissive Diffractive Segmented Telescope by Reactive Ion Figuring

Plasma Figure Correction Method Based on Multiple Distributed Material Removal Functions

The Tailored Material Removal Distribution on Polyimide Membrane Can Be Obtained by Introducing Additional Electrodes

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