Highly conformal magnesium oxide thin films by low-temperature chemical vapor deposition from Mg(H3BNMe2BH3)2 and water

Wang, Wenjiao B.; Yang, Yu; Yanguas‐Gil, Angel; Chang, Ning; Girolami, Gregory S.; Abelson, John R.

doi:10.1063/1.4795860

Cited by 26 publications

(18 citation statements)

References 37 publications

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“…The MgO thin films have been fabricated by various synthetic methods including e-beam evaporation (Kurt et al 2010), atomic layer deposition (Burton et al 2009), chemical vapor deposition (Wang et al 2013), radio frequency magnetron sputtering (Yongle et al 2014), spray pyrolysis (Bian et al 2004) and sol gel process (Choi and Hwang 2000). However, all these methods have their limitations such as low deposition rate, low film density and poor homogeneity.…”

Section: Introductionmentioning

confidence: 99%

Optical properties of MgO thin films grown by laser ablation technique

et al. 2016

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We have investigated the structural, linear and nonlinear optical properties of high-quality MgO thin films deposited by laser ablation technique on quartz substrates. The deposition process was carried out at various temperatures of the substrates from room temperature to 600°C in order to investigate these properties of the films and their mutual influence. The structural and morphological properties of the films were investigated by X-ray diffraction. The quality of the films was improved with an increase of the substrate temperature. The linear optical properties of the films were studied by classic and timeresolved photoluminescence spectra in the broad range of the temperature form 13 to 300 K. An innovative time-resolved photoluminescence technique let us precisely measure the decay time in the real time. Results of these measurements reveal a simple exponential decay behavior typical for well oriented crystalline thin films. Presented spectra confirm high structural and linear optical quality of investigated films. The nonlinear optical properties of the films were investigated by third harmonic generation technique. Our results indicated that the substrate temperature slightly affected nonlinear optical properties and the values of third order nonlinear susceptibilities at the 600°C were found to be smaller relative to RT. All these unusual properties of MgO thin films deposited by laser ablation technique made this material very interesting for the subsequent oriented growth of the other oxide a but also for potential other optical applications.

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Section: Introductionmentioning

confidence: 99%

Optical properties of MgO thin films grown by laser ablation technique

et al. 2016

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“…The low density of the film is due to the low deposition temperature; at higher temperatures, e.g., 275 C, the film density is $93% of the bulk value. 41 The temperaturedependent film density is accounted for in the analytical model below.…”

Section: Methodsmentioning

confidence: 99%

“…At the growth temperature of 220 C, the atomic density is 3.4 Â 10 22 at/cm 3 , which is 63% of the bulk value [it is 93% for growth at 275 C (Ref. 41)]. The stoichiometry of MgO is measured to be 1:1, hence, the consumption rates of Mg(DMADB) 2 and H 2 O on the walls at any particular depth are always equal.…”

Section: A Effect Of Wall Adsorption On the Diffusivitymentioning

confidence: 99%

Superconformal chemical vapor deposition of thin films in deep features

Wang

Chang

Codding

et al. 2014

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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The authors report a new and potentially widely applicable method for the chemical vapor deposition (CVD) of films with a superconformal thickness profile in recessed features, i.e., the rate of growth increases with depth away from the opening. Provided that the aspect ratio of the feature is not too large, deposition initially affords a “V” shaped profile; continued deposition eventually fills the feature without leaving a void or seam of low-density material along the centerline. Superconformal deposition occurs under the following set of conditions: (1) growth involves two coreactants; (2) the deposition rate depends directly on the surface concentrations of both coreactants; (3) the molecular diffusivities of the coreactants are different; and (4) the partial pressures of the coreactants are chosen such that the surface coverage of the more rapidly diffusing coreactant is relatively small, and therefore rate-limiting, near the opening. The latter condition can be fulfilled if the more slowly diffusing coreactant is employed in excess or has an intrinsically higher sticking coefficient. Under these circumstances, the deposition rate will increase deeper in the feature for the following reason: the pressure of the slowly diffusing coreactant necessarily drops more quickly with depth than that of the rapidly diffusing coreactant, which increases the fractional surface coverage of the fast-diffusing coreactant and with it the growth rate. At sufficiently large depths, eventually the surface concentration of the more slowly diffusing coreactant will become rate limiting and the growth rate will begin to fall; to obtain superconformal growth, therefore, conditions must be chosen so that the growth rate does not surpass its peak value. As a specific example of how this new approach can be implemented, MgO is deposited at 220 °C using the aminodiboranate precursor Mg(DMADB)2 and H2O. Under properly chosen conditions, the growth rate increases from 1.0 nm/min at the trench opening to 1.8 nm/min at a depth/width ratio of 18. The authors propose a kinetic model that quantitatively explains these observations and, more generally, predicts the film profile as a function of the partial pressures of the coreactants in the gas feed, the molecular diffusivities, and the aspect ratio of the feature. An additional benefit of the model is that it can be used to predict conditions under which perfectly conformal CVD depositions will result. The present method should enable the fabrication of nanoscale devices in which high aspect ratio recessed features need to be completely filled. The method is intrinsic in nature and does not require special surface preparation, the use of a catalyst, or cycles of deposition and etching.

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“…Apart from this, number of groups utilizes chemical deposition (CVD) method to grow MgO thin films on different substrates [136][137][138].…”

Section: Mgo Thin Filmsmentioning

confidence: 99%

Bottom-Up and Top-Down Approaches for MgO

Singh¹,

Kumar²,

Sharma³

et al. 2020

Sonochemical Reactions

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In this chapter, we present an overview of synthesis of MgO nanoparticles and thin films by using top-down and bottom-up approaches. The bottom-up approaches are generally utilized to grow nanoparticles by the methods that involve chemical reactions. Sometimes, methods based on these reactions are also able to grow thin films. The top-down approaches are preferred for growing thin films where bulk material is used for depositions. The methods, which are frequently used, are radio frequency sputtering, pulsed lased deposition, and molecular beam epitaxy and e-beam evaporation. Sometimes, methods like mechanical milling and high energy ball milling are used to grow nanoparticles.

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Highly conformal magnesium oxide thin films by low-temperature chemical vapor deposition from Mg(H3BNMe2BH3)2 and water

Cited by 26 publications

References 37 publications

Optical properties of MgO thin films grown by laser ablation technique

Optical properties of MgO thin films grown by laser ablation technique

Superconformal chemical vapor deposition of thin films in deep features

Bottom-Up and Top-Down Approaches for MgO

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