2017
DOI: 10.1016/j.jcat.2017.02.029
|View full text |Cite
|
Sign up to set email alerts
|

Highly crystalline poly(heptazine imides) by mechanochemical synthesis for photooxidation of various organic substrates using an intriguing electron acceptor – Elemental sulfur

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

1
72
0
5

Year Published

2018
2018
2023
2023

Publication Types

Select...
7
2

Relationship

6
3

Authors

Journals

citations
Cited by 72 publications
(78 citation statements)
references
References 43 publications
1
72
0
5
Order By: Relevance
“…S2a †). 20,21 The valence band maximum (VBM) in K-PHI determined by ultraviolet photoelectron spectroscopy (UPS) is located at $2.5 V ( Fig. S2e †).…”
Section: Resultsmentioning
confidence: 99%
“…S2a †). 20,21 The valence band maximum (VBM) in K-PHI determined by ultraviolet photoelectron spectroscopy (UPS) is located at $2.5 V ( Fig. S2e †).…”
Section: Resultsmentioning
confidence: 99%
“…The O 2 ‐based approach quite often suffers from low selectivity due to overoxidation of the aldehyde to the carboxylic acid . The selectivity of the process can thereby be significantly enhanced by replacing O 2 with elemental sulfur (S 8 ) (Scheme ) …”
Section: Application Of Ionic Carbon Nitrides In Photocatalysismentioning
confidence: 99%
“…Photo‐Hantzsch synthesis of pyridines has been developed using K‐PHI (Scheme ) . Herein, instead of handling the aliphatic aldehyde under air free conditions, it is produced right before consumption from the respective alcohol in a first step.…”
Section: Application Of Ionic Carbon Nitrides In Photocatalysismentioning
confidence: 99%
“…Due to this structural peculiarity, the valence band position becomes significantly more positive (+2.6 eV vs. RHE) ( Figure 1). K-PHI is highly effective for different photooxidation processes such as oxygen evolution reaction [18], oxidation of alcohols followed by Hantzsch pyridine synthesis [19].…”
Section: Introductionmentioning
confidence: 99%