2006
DOI: 10.1103/physrevb.74.045207
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Highly effectiveMg2Si1xSnxthermoelectrics

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Cited by 643 publications
(372 citation statements)
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“…In the Al-doped sample the Raman peak (520 cm -1 ) of crystalline Si also appears in the spectrum, indicating that the silicon is not fully covered by the Al-doped film, some oxide areas covers the silicon wafer, as it is proved by the image of the silicon related Raman line. This fact correlates with the high roughness measured by AFM in the samples [8]. The ratio of the Mg2Sn (peak at 220 cm -1 )…”
Section: Discussionsupporting
confidence: 52%
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“…In the Al-doped sample the Raman peak (520 cm -1 ) of crystalline Si also appears in the spectrum, indicating that the silicon is not fully covered by the Al-doped film, some oxide areas covers the silicon wafer, as it is proved by the image of the silicon related Raman line. This fact correlates with the high roughness measured by AFM in the samples [8]. The ratio of the Mg2Sn (peak at 220 cm -1 )…”
Section: Discussionsupporting
confidence: 52%
“…shown that the as grown films consist mainly of Mg2Sn phase and a small quantity of Mg2Si phase [8]. Far infrared (FIR) properties of grown Mg2Sn films have also proved the formation of Mg stannide with small quantity of Mg silicide.…”
Section: Discussionmentioning
confidence: 93%
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“…Various substitutions have been tested and the best results have been obtained when the mass difference between elements is the highest, i.e., with Si and Sn [Fedorov 2003]. A ZT of 1.1 has then been found at 800K, a better value than with n-type Si-Ge [Zaitsev 2006]. …”
Section: Mg 2 Si 1-x Sn Xmentioning
confidence: 96%