Highly efficient colloid–solution deposition planarization of Hastelloy substrate for IBAD-MgO film

Zhou, Hualan; Chai, Fangfang; Fang, Jianhui; Shi, Liyi; Cai, Chuanbing; Yuan, Shuai

doi:10.1007/s11164-015-2314-9

Cited by 9 publications

(2 citation statements)

References 16 publications

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“…The relatively high surface roughness of (commercially available) stainless steel limits the imprinting of nanofeatures. To overcome this problem, planarization of the steel surface was conducted using the ZrO 2 dispersion in a solution-deposition planarization technique [38]. The technique involves simple spin coating of successive layers of ZrO 2 from the nanoparticle dispersion.…”

Section: Imprinting Of Zro 2 Patterns On Stainless Steelmentioning

confidence: 99%

Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding

Arisoy¹,

Czolkos²,

Johansson³

et al. 2019

Nanotechnology

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Mold cost and mold lifetime are essential concerns for mass production of micro/nano-patterned surfaces by nanoimprint lithography or micro/nanoinjection molding. Master molds are typically produced by subtractive processing using wafer-based clean room techniques. For imprint lithography, polymer copies of such molds can often be employed, but the durability of such molds is quite limited. The conditions of high temperature and pressure for injection molding require use of the durable masters created in stainless steel, nickel or other robust materials, but such approaches are challenged by the high cost of patterning these substrates and limited lifetime. Here, we report the fabrication of durable crystalline zirconium dioxide (ZrO2) masters via a simple direct imprint technique. ZrO2 nanoparticles (NPs) were formulated into an ink and imprinted on a variety of substrates using a solvent-assisted patterning technique and subsequently annealed to increase the mechanical durability of the mold. The hardness and modulus values of the ZrO2 coatings reached 11 ± 2 GPa and 120 ± 10 GPa, respectively after annealing. The hard ZrO2 mold was then employed for precision patterning of polymer surfaces by thermal and UV nanoimprinting lithography (NIL) techniques, and by injection molding. High fidelity pattern transfer continued throughout 115 000 injection molding cycles, there was no evidence of delamination, breakage or wear in the ZrO2 mold. Our simple imprint patterning technique using ZrO2 NPs inks enable us to fabricate robust molds with excellent thermal and mechanical properties as easily as imprinting simple polymer replicas. This simple and low-cost approach to mold preparation can enable a large variety of high throughput or large area nano-replication technologies.

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Section: Imprinting Of Zro 2 Patterns On Stainless Steelmentioning

confidence: 99%

Low-cost, durable master molds for thermal-NIL, UV-NIL, and injection molding

Arisoy¹,

Czolkos²,

Johansson³

et al. 2019

Nanotechnology

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“…Previously, our group has developed an easy-reproducible and cost-effectively method to reduce the surface roughness of substrates with high efficiency, which is called the colloid− solution deposition planarization (CSDP) process. 23 Furthermore, FTO nanocrystal colloid exhibiting notable electric conductivity, high dispersity, and stability has been prepared. 24 On the basis of these previous studies, the CSDP method is trying to be employed to modify the FTO glasses.…”

Section: Introductionmentioning

confidence: 99%

High-Performance Dye-Sensitized Solar Cells Based on Colloid–Solution Deposition Planarized Fluorine-Doped Tin Oxide Substrates

Zhang

Lou

Liu

et al. 2018

ACS Appl. Mater. Interfaces

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The transmittance and conductivity of fluorine-doped tin oxide (FTO) conductive glasses are the critical factors limiting the performance of dye-sensitized solar cells (DSSCs). Here, the transmittance and conductivity of commercial FTO glasses were improved via a colloid-solution deposition planarization (CSDP) process. The process includes two steps. First, the FTO nanocrystal colloid was deposited on the FTO glasses by spin-coating. Secondly, the coated glasses were treated by FTO precursor solution. Compared to the bare FTO glasses, the modified FTO glasses by the CSDP process achieved 4% increase in transmittance (at 550 nm) and 11% decrease in sheet resistance, respectively. In addition, the modified FTO glasses can reduce the aggregation of Pt nanoparticles and improve the electrocatalytic activity of Pt counter electrodes. When the modified FTO glasses were used to assemble DSSCs, the cells got a photoelectric conversion efficiency as high as 9.37%. In contrast, the efficiency of reference cells using bare FTO substrates was about 8.24%.

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