2014
DOI: 10.1088/0022-3727/47/26/265301
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Highly efficient photocatalytic TiO2coatings deposited by open air atmospheric pressure plasma jet with aerosolized TTIP precursor

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Cited by 44 publications
(49 citation statements)
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“…In principle, the presence of dopants reduce the band gap and hence redshift the effect. This redshift was observed, by Fakhouri et al [11], in the absence of dopants in visible light, however only after a thermal post treatment of the APPJ deposited titanium oxide films. This was verified by evaluating the antimicrobial effect induced by visible light in absence of dopants, and by degradation of Rhodamine B under UV light.…”
Section: Introductionmentioning
confidence: 54%
“…In principle, the presence of dopants reduce the band gap and hence redshift the effect. This redshift was observed, by Fakhouri et al [11], in the absence of dopants in visible light, however only after a thermal post treatment of the APPJ deposited titanium oxide films. This was verified by evaluating the antimicrobial effect induced by visible light in absence of dopants, and by degradation of Rhodamine B under UV light.…”
Section: Introductionmentioning
confidence: 54%
“…The PCA experiments were conducted using a two steps method. First, a screening study was performed by degrading RhB (10 ml, 5 mg/L) at room temperature according to the method reported in a reference . The TiO 2 and nano‐Ag‐TiO 2 samples, deposited on 9 × 25 mm 2 glass substrates were placed in a UV grade reactor cell with a diameter of 35 mm and a height of 20 mm facing a 125 W Philips white light source.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The deposition methodology is based on a setup previously reported, [33] which was inspired by work from Dowling Denis et al [35] Ag-TiO 2 coating were prepared by introducing TTIP into an open-air APPJ (Plasmatreater AS400; Plasmatreat GmbH, Steinhagen, Germany) by means of an "in-house" constructed spraying system previously reported ( Figure 1). [33] High deposition rates (10-20 µm/s) were achieved by spraying a liquid precursor into the plasma torch. The Ag NPs (average particle size of 100 nm) were dispersed in TTIP liquid precursor with a concentration ranging from 0 to 0.7wt%.…”
Section: Plasma Process Used For Depositionmentioning
confidence: 99%
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