2012 IEEE 12th Topical Meeting on Silicon Monolithic Integrated Circuits in RF Systems 2012
DOI: 10.1109/sirf.2012.6160157
|View full text |Cite
|
Sign up to set email alerts
|

Highly linear robust RF switch with low insertion loss and high power handling capability in a 65nm CMOS technology

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
5
0

Year Published

2013
2013
2022
2022

Publication Types

Select...
5
2

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(5 citation statements)
references
References 5 publications
0
5
0
Order By: Relevance
“…To improve the power handling performance and reduce C shunt , V B must be driven with a negative bias larger than the DC offset voltage at V D2 node. by V B through R b improves the insertion loss and power handling performance [4,10,11], where the resistance of R B is 10 kΩ. The chip size is 0.51 × 0.78 mm 2 , including the DC and RF pads.…”
Section: Large-signal Operationmentioning
confidence: 99%
See 2 more Smart Citations
“…To improve the power handling performance and reduce C shunt , V B must be driven with a negative bias larger than the DC offset voltage at V D2 node. by V B through R b improves the insertion loss and power handling performance [4,10,11], where the resistance of R B is 10 kΩ. The chip size is 0.51 × 0.78 mm 2 , including the DC and RF pads.…”
Section: Large-signal Operationmentioning
confidence: 99%
“…The centre frequency of the switch circuit was set to be 45 GHz by optimising the length of the transmission lines approximating to a λ /4 wavelength. The body bias driven by V B through R b improves the insertion loss and power handling performance [4, 10, 11], where the resistance of R B is 10 kΩ.…”
Section: Characteristic Of Dual‐gate Mosfet and Spdt Switch Designmentioning
confidence: 99%
See 1 more Smart Citation
“…Compared to the positive-intrinsic-negative (PIN) diode [5,6], micro-electro-mechanical systems (MEMS) [7,8], and gallium arsenide (GaAs) psuedomorphic high electron mobility transistor (pHEMT) [9,10], Silicon-oninsulator (SOI) CMOS process shares the important features of being fast, reliable, and highly integratable, and thus, becomes a preferred choice for switch applications [11,12,13,14]. The low break-down voltage and conductive substrate limit the standard bulk CMOS for RF switch applications [15,16,17]. In a partially-deleted (PD) technology [18], both floating body (FB) and body contacted (BC) FETs are offered [19].…”
Section: Introductionmentioning
confidence: 99%
“…2 illustrates the MOSFET switch used for (a) to (e) as shown in Fig. 1, which can be composed of general switches [2,3]. They are turned on and off by toggling the voltage of the SW in Fig.…”
Section: Introductionmentioning
confidence: 99%