“…The XRD patterns of TiOPc films deposited on OTSmodified Si/SiO 2 substrates at 90, 120, 150°C were displayed in Figure 3b. An intense peak at 7.5°(d = 11.8 Å) due to the diffraction from (010) plane of a-phase [18][19][20] was observed, especially for 150°C, indicating highly ordered a-phase films with the (010) lattice plane parallel to the substrate, i.e., TiOPc molecules preferentially stood on substrates with an "edge-on" style orientation (Fig. 4b), in which the molecular plane made an angle of 62°with respect to the substrates.…”