Highly oriented 3D-hexagonal silica thin films produced with cetyltrimethylammonium bromide

Grosso, David; Balkenende, A.R.; Albouy, P.A.; Lavergne, Marie-Anne; Mazérolles, L.; Babonneau, Florence

doi:10.1039/b003178j

Cited by 137 publications

(117 citation statements)

References 23 publications

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“…This is usually achieved by thermal decomposition of the organic phase and is always accompanied by a unidirectional contraction of the domain normal to the surface plane. [7,10,14,33] For TMO-based films the degradation of the mesoporous structure is associated with the crystallization of the network, [34] but it can still be controlled to obtained pure, crystalline mesoporous networks. [32,35,36] On the other hand, structures obtained with the TEOS/CTAB system presented here are stable at temperatures up to 800 C. [28] Also, the cyclic and branched silica oligomers making up the film are stable up to 400 C and collapse after this temperature without noticeably perturbing the mesoporosity.…”

Section: The Treatment Stepmentioning

confidence: 99%

“…[32,35,36] On the other hand, structures obtained with the TEOS/CTAB system presented here are stable at temperatures up to 800 C. [28] Also, the cyclic and branched silica oligomers making up the film are stable up to 400 C and collapse after this temperature without noticeably perturbing the mesoporosity. Some proposed softer treatments exploit the fact that, under such acidic conditions, silica and CTAB are in an S + X ± I + -type ionic interaction (CTA + Br ± + H 2 O±Si), [12] and that CTAB thermally decomposes at around 300 C. It is possible to combine mild-temperature treatment, basic treatment (NH 3 atmosphere), [14] solvent extraction, [14,37] and degradation of organics by UV±O 3 . [38] Thus, there are a great variety of possible treatments that can be adapted to the type of materials and the targeted application.…”

Section: The Treatment Stepmentioning

confidence: 99%

“…Also, at such low HCl concentrations, no exchange occurs with the bromide of the CTAB, as was previously revealed by Rutherford backscattering (RBS). [14] One can then conclude that the effects of HCl can be neglected during the MSS period of organization.…”

Section: Feature Articlementioning

confidence: 99%

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Fundamentals of Mesostructuring Through Evaporation‐Induced Self‐Assembly

Grosso

Cagnol

Soler-Illia

et al. 2004

Adv Funct Materials

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762

732

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This article gives an overall view of the mechanisms involved in the mesostructuring that takes place during the formation of surfactant‐templated inorganic materials by evaporation. Since such a method of preparation is well suited to fabricating thin films by dip coating, spin coating, casting, or spraying, it is of paramount interest to draw a general description of the processes occurring during the formation of self‐assembled hybrid organic/inorganic materials, taking into account all critical parameters. The following study is based on very recent works on the meso‐organization of thin silica films using tetraethylorthosilicate (TEOS) as the inorganic source and cetyltrimethylammonium bromide (CTAB) as the structuring agent, but we will show that the method can also be extended to other systems based on non‐silica oxides and block copolymer surfactants. We demonstrate that the organization depends mainly on the chemical composition of the film when it reaches the modulable steady state (MSS), where the inorganic framework is still flexible and the composition is stable after reaching an equilibrium in the diffusion of volatile species. This MSS state is generally attained seconds after the drying line, and the film's composition depends on various parameters: the relative vapor pressures in the environment, the evaporation conditions, and the chemical conditions in the initial solution. Diagrams of textures, in which the stabilized structures are controlled by local minima, are proposed to explain the complex phenomena associated with mesostructuring induced by evaporation.

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Section: The Treatment Stepmentioning

confidence: 99%

Section: The Treatment Stepmentioning

confidence: 99%

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Fundamentals of Mesostructuring Through Evaporation‐Induced Self‐Assembly

Grosso

Cagnol

Soler-Illia

et al. 2004

Adv Funct Materials

Self Cite

762

732

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“…In particular, mesoporous silica films with various structures (2D, 3D hexagonal or cubic) have been subject to growing interest because of their possible applications in the fields of optics, catalysis, sensing and separation. Thin films with good homogeneity and optical quality can be obtained through liquid deposition techniques such as spin and dip-coating (Beck et al, 1992;Zhao et al,1998;Grosso et al, 2000;Besson et al, 2000). * To whom correspondence should be addressed.…”

Section: Introductionmentioning

confidence: 99%

Adsorption and Desorption Isotherms at Ambient Temperature Obtained by Ellipsometric Porosimetry to Probe Micropores in Ordered Mesoporous Silica Films

et al. 2005

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Ellipsometric Porosimetry is a non destructive technique well adapted to the measurement of isotherms of porous thin films. We present results obtained on ordered mesoporous silica films prepared by surfactant templating methods. Although the applications of such films require knowledge of mesoporous network, the micropores, which remain uncontrolled during the film elaboration, could play a main role in the film properties and then need to be characterized. We take advantage of the ability of our experiment to perform isotherms with different organic adsorptives of different sizes (branched or linear molecules) in order to probe micropores in these ordered mesoporous silica films.

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“…By using the effective medium approximation (EMA) models, the porosity of the films can be estimated from the comparison between the experimental refractive index, and the theoretical value for fully densified material (2.01 at 600 nm for wurtzite ZnO [30,31]): the nanocomposite film is thus modeled as an effective medium composed of dense ZnO and pores. Among the different EMA models that can be used, the Bruggemann function [32] is universally accepted and widely employed for porosity evaluation [33,34]. Table 5 shows Fig.…”

Section: Samplementioning

confidence: 99%

CO optical sensing properties of nanocrystalline ZnO–Au films: Effect of doping with transition metal ions

Gaspera

Guglielmi

Perotto

et al. 2012

Sensors and Actuators B: Chemical

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CO optical sensing properties of nanocrystalline ZnO-Au films: Effect of doping with transition metal ions Della Gaspera, E.; Guglielmi, M.; Perotto, G.; Agnoli, S.; Granozzi, G.; Post, M. L.; Martucci, A. Sensors and Actuators B 161 (2012) [675][676][677][678][679][680][681][682][683] Contents lists available at SciVerse ScienceDirect Keywords: Nanoparticles Nanocomposite Thin films Sensors a b s t r a c t Zinc oxide nanocrystals, pure and doped with transition metal ions, have been synthesized using colloidal techniques; after purification and concentration protocols, the ZnO solutions are mixed with monodisperse Au colloidal suspensions and used for thin film depositions. The effect of the dopant ions on the structural, morphological and optical properties of the as-synthesized colloids as well as the nanocomposite thin films has been analyzed and discussed. The dopant presence has been found to affect the CO optical sensing properties of the nanocomposite ZnO-Au films: compared to pure ZnO, an increase in sensitivity up to 80% and 55% has been detected for Co-doped and Mn-doped ZnO respectively, while Ni-doped ZnO films show only minor improvements. This observation has been ascribed to the multiple oxidation states of cobalt and manganese ions that can facilitate electron transfer between the target gas and semiconductive oxide matrix, and also to the lower surface concentration of Ni ions inside ZnO crystals, as compared to Co and Mn. A fast and reversible response after repeated CO exposures has been detected for all tested samples, and a linear response intensity with the order of magnitude of CO concentration has been observed in the 10-10,000 ppm range, with a lower detection limit of 1-2 ppm.Crown

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Highly oriented 3D-hexagonal silica thin films produced with cetyltrimethylammonium bromide

Cited by 137 publications

References 23 publications

Fundamentals of Mesostructuring Through Evaporation‐Induced Self‐Assembly

Fundamentals of Mesostructuring Through Evaporation‐Induced Self‐Assembly

Adsorption and Desorption Isotherms at Ambient Temperature Obtained by Ellipsometric Porosimetry to Probe Micropores in Ordered Mesoporous Silica Films

CO optical sensing properties of nanocrystalline ZnO–Au films: Effect of doping with transition metal ions

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