Highly Oriented V₂O₅ Nanocrystalline Thin Films by Plasma-Enhanced Chemical Vapor Deposition

Abstract

Plasma-enhanced chemical vapor deposition of vanadium pentoxide thin films from a vanadyl(IV) β-diketonate compound has been performed in a low-pressure reactor under different operating conditions. The effect of various parameters, such as the flow rates of the carrier and reactive gas and the substrate temperatures, on films composition, microstructure, and morphology was investigated in detail. Controlled variations of the synthesis conditions allowed a fine modulation of the sample properties, as shown by XRD and AFM analyses. In particular, at 200 °C and moderate oxygen flow, nanophasic V 2 O 5 with a strong (001) preferential orientation could be easily obtained. The composition and purity of the films are studied by XPS and SIMS analyses, with special regard to filmsubstrate interdiffusion phenomena. Optical properties of the films are also investigated.

Nucleation and Growth of Nanophasic CeO2 Thin Films by Plasma‐Enhanced CVD

“…This effect was observed for all the films synthesized and could be ascribed to the continuous bombardment of ionic and neutral species on the growing film. [67] A further contribution to the interface broadening could come from a knock-on processes exerted by the primary ion beam. Since the maximum substrate temperature was 300 C, any significant thermal influence on film±substrate intermixing was excluded.…”

Phase‐Selective CVD of Vanadium Oxide Nanostructures

“…[13,14,19,20] Among vapor phase techniques, CVD is gaining increasing attention for the fabrication of VO x films. [1,2,[4][5][6][21][22][23] Despite a large body of data available on vanadium oxide nanostructures, phase-selective synthesis of V x O y compounds poses a synthetic challenge mainly due to the structure complexity and facile phase transformation within the V-O binary system. Deposition of VO 2 on glass was recently investigated using [VCl 4 ] and [VO(acac) 2 ] as precursors in atmospheric pressure CVD.…”

Fabrication of pulsed-laser deposited V2O5 thin films for electrochromic devices

“…sol-gel process (Ozer, 1997), sputtering (Cazzanelli et al, 1999), and chemical vapor deposition (Barreca et al, 2000). Among the deposition methods, the pulsed-laser deposition (PLD) is a predominant method.…”