Highly oriented zinc oxide films grown by the oxidation of diethylzinc

Abstract

Zinc oxide films, with a high degree of c-axis orientation, have been grown on glass substrates by a chemical vapor deposition process involving the oxidation of diethylzinc. Film growth was carried out over the 200–500 °C temperature range; however, the maximum crystal orientation was found to occur with substrate temperatures between 325 and 400 °C. The effect of different substrate materials on crystallographic orientation is also described in this letter.

Growth of Al-doped ZnO thin films by pulsed DC magnetron sputtering

“…AZO thin films have been prepared by several techniques such as RF sputtering process [7], sol-gel method [8], pulsed laser deposition (PLD) [9], and chemical vapor deposition (CVD) [10]. Among these processes, the sputtering process is one of the best methods for preparation of AZO films because it has a lot of advantages such as low substrate temperature, good surface roughness, and low cost [11][12][13][14].…”

Structural and optical properties of nano-structured tungsten-doped ZnO thin films grown by pulsed laser deposition

“…Progress made in the area of ZnObased materials and devices shows that ZnO has a great potential due to its wide and direct band gap of 3.37 eV and a large excitonic binding energy of 60 meV at room temperature [12]. In the past several years, various methods have been employed to prepare ZnO films such as chemical vapor deposition (CVD) [13][14][15], rf magnetron sputtering [16,17], sol-gel process [18,19], photoatomic layer deposition [20], spray pyrolysis [21,22], metal oxide chemical vapour deposition (MOCVD) [23], molecular beam epitaxy (MBE) [24,25], filtered cathodic vacuum arc technique (FCVA) [26,27] and pulsed laser deposition (PLD) [28][29][30][31].…”

Effect of sol concentration on the properties of ZnO thin films prepared by sol–gel technique

“…It is an attractive and promising material for many applications in surface acoustic wave devices (SAW) [2], transparent electrode [3], blue and ultraviolet (UV) light emitters [4], solar cell windows [5], gas sensors [6], photovoltaic device [7] and room temperature ultraviolet lasers [4]. Various growth techniques such as chemical vapor deposition [8], r.f. magnetron sputtering [9], pulsed laser deposition (PLD) [3], evaporation [10], spray pyrolysis [11], photo-atomic layer deposition [12], metal oxide chemical vapor deposition (MOCVD) [13], molecular beam epitaxy (MBE) [4] and sol-gel process [14] have been used for ZnO film.…”