2019
DOI: 10.1016/j.mencom.2019.03.035
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Hole mobility in thieno[3,2-b]thiophene oligomers

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Cited by 25 publications
(9 citation statements)
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“…In thin solid layers, the charge carrier mobility was measured using the technique of charge extraction by linearly increasing voltage (CELIV) . Metal-insulator-semiconductor (MIS) diode structures, similar to those described earlier, , were prepared. Onto the ITO (indium-tin oxides) electrode of the ITO/glass substrate, a SiO 2 insulator layer of 70 nm in thickness was deposited by conventional magnetron sputtering.…”
Section: Methodsmentioning
confidence: 99%
“…In thin solid layers, the charge carrier mobility was measured using the technique of charge extraction by linearly increasing voltage (CELIV) . Metal-insulator-semiconductor (MIS) diode structures, similar to those described earlier, , were prepared. Onto the ITO (indium-tin oxides) electrode of the ITO/glass substrate, a SiO 2 insulator layer of 70 nm in thickness was deposited by conventional magnetron sputtering.…”
Section: Methodsmentioning
confidence: 99%
“…Charge carrier mobility was measured by the charge selective CELIV (charge extraction by linearly increasing voltage) technique [37,38] via the selective extraction of each charge carrier species in a SiO 2 inserted MIS (metal-insulator-semiconductor) structure [39]. A digital USB-oscilloscope (DL-Analog Discovery, Digilent Inc., Pullman, WA, USA) was both master pulse generator and transient current pulse recorder.…”
Section: Methodsmentioning
confidence: 99%
“…As a result, for measuring the mobility of charge carriers by the MIS-CELIV technique, the samples of the glass/ITO/SiO 2 (70 nm)/D1-3/mCP (10%)/Al (80 nm) architecture were prepared. More experimental details and calculations of the charge carrier mobility are described in [54,[58][59][60] and Supplementary Materials.…”
Section: Charge Mobility Measurementsmentioning
confidence: 99%