Holistic RBS–PIXE data reanalysis of SBT thin film samples

Reis, M.A.; Barradas, N.P.; Pascual-Izarra, C.; Chaves, P.C.; Ramos, A.R.; Aguilar, Gerardo González; Costa, Maria Elisabete V.; Salvado, Isabel M. Miranda

doi:10.1016/j.nimb.2007.04.284

Cited by 12 publications

(10 citation statements)

References 5 publications

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“…In this case, using the same beam energy to analyse both the standards and the unknown samples3 leads to a very simple quantitative analytical procedure. On the other hand, in the other extreme of quantitatively analysable complexity one can find, presently, the analysis of multilayer medium thick films having light, medium and heavy elements in their composition 4–6…”

Section: Introductionmentioning

confidence: 99%

PIXE analysis of multilayer targets

et al. 2011

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Particle induced X-ray emission (PIXE) analysis is generally accepted to be a depth insensitive technique and most of the work up until recently has been oriented to the analysis of in-depth homogeneous samples. Up until recently, multilayer targets were normally looked upon as a source of problems, implying a limitation to qualitative or semi-quantitative approaches. The growing need to analyse layered targets having complex structures or close Z elements, which provide unsolvable Rutherford backscattering spectrometry (RBS) spectra, pointed out the need to change this situation. The coupling of two software codes, namely NDF and DATTPIXE, was thus carried out a few years ago based on the development of a PIXE yields simulation library, LibCPIXE. Since then, developments were introduced at various levels, from the software code level to the level of analytical methodologies and even equipment. Starting in the concepts of equivalent depth and differential PIXE, and ending in the possibilities opened up by the use of microcalorimeter high-resolution detectors within this context, an overview of the current status of development of the analytical technology involved is made.

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Section: Introductionmentioning

confidence: 99%

PIXE analysis of multilayer targets

et al. 2011

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“…The DataFurnace code was used to analyse Niepce's heliograph of 1827 [268], a 19 th century reproduction of Frans Hals' La Bohémienne [269], oxidation of carbon nanotubes [270], and photovoltaic and ferroelectric materials [271] [272] [273]. The La Bohémienne analysis followed a PIXE/BS analysis which was not self-consistent [274], but was itself flawed by an incorrect treatment of the sample roughness.…”

Section: Nuclear and Atomic Methods Combinedmentioning

confidence: 99%

Ion Beam Analysis: A Century of Exploiting the Electronic and Nuclear Structure of the Atom for Materials Characterisation

Jeynes

Webb

Lohstroh

2011

Rev. Accl. Sci. Tech.

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Analysis using MeV ion beams is a thin film characterisation technique invented some 50 years ago which has recently had the benefit of a number of important advances. This review will cover damage profiling in crystals including studies of defects in semiconductors, surface studies, and depth profiling with sputtering. But it will concentrate on thin film depth profiling using Rutherford backscattering, particle induced X-ray emission and related techniques in the deliberately synergistic way that has only recently become possible. In this review of these new developments, we will show how this integrated approach, which we might call “total IBA”, has given the technique great analytical power

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“…The complementarity of PIXE to RBS in characterizing thin films has been reported in the literature [5,6]. It was demonstrated that the simultaneous and self-consistent analysis of both the RBS and PIXE spectra, through the NDF code [7], allows for a more accurate interpretation of depth and concentration profiles of multilayer samples as compared to the conventional analysis of the data.…”

Section: Introductionmentioning

confidence: 92%

RBS and PIXE analysis of chlorine contamination in ALD-Grown TiN films on silicon

Meersschaut

Käyhkö

Lenka

et al. 2013

AIP Conference Proceedings

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In situ spectroscopic ellipsometry study on the growth of ultrathin TiN films by plasma-assisted atomic layer deposition Abstract. The performance, strengths and limitations of RBS and PIXE for the characterization of trace amounts of Cl in TiN thin films are critically compared. The chlorine atomic concentration in ALD grown TiN thin films on Si is determined for samples grown at temperatures ranging from 350°C to 550°C. We show that routine Rutherford backscattering spectrometry measurements (1.5 MeV He + ) and PIXE measurements (1.5 MeV H + ) on 20 nm thick TiN films allow one to determine the Cl content down to 0.3 at% with an absolute statistical accuracy reaching 0.03 at%. Possible improvements to push the sensitivity limit for both approaches are proposed.

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Holistic RBS–PIXE data reanalysis of SBT thin film samples

Cited by 12 publications

References 5 publications

PIXE analysis of multilayer targets

PIXE analysis of multilayer targets

Ion Beam Analysis: A Century of Exploiting the Electronic and Nuclear Structure of the Atom for Materials Characterisation

RBS and PIXE analysis of chlorine contamination in ALD-Grown TiN films on silicon

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