Hollow cathode electron gun for beam generation in forevacuum gas pressure

Бурдовицин, В. А.; Oks, Eugene; Serov, A. O.

doi:10.1109/beams.1998.822467

Cited by 1 publication

(2 citation statements)

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“…The flat stainless steel (SS) anode (2) of the discharge system has an emission hole (3) of diameter about 10 mm covered with a fine SS mesh (0.2 × 0.2 mm 2 mesh size, transparency 70%). Electrons are extracted from the hollow cathode emission plasma (4) and accelerated by the dc voltage U a applied in the rather short (few millimeters) accelerating gap between the anode (2) and the accelerating electrode (7). The electron beam (5) is focused by the magnetic field coil (6) and then propagates along the drift area up to the electron collector, which is located about 0.5 m far from accelerating gap.…”

Section: Experimental Set-up and Proceduresmentioning

confidence: 99%

“…0963-0252/10/055003+07$30.00 We have shown in previous experiments that in the fore-pump pressure range the electron beam treatment of an insulated target provides a steady-state value of the floating potential target which is much less than the electron gun accelerating potential [7]. Hence as a result of such observation successful electron beam welding of non-conducting alumina ceramics was demonstrated under these conditions [8].…”

Section: Introductionmentioning

confidence: 97%

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Electron beam treatment of non-conducting materials by a fore-pump-pressure plasma-cathode electron beam source

Бурдовицин

Климов

Medovnik

et al. 2010

Plasma Sources Sci. Technol.

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In the irradiation of an insulated target by an electron beam produced by a plasma-cathode electron beam source operating in the fore-vacuum pressure range (5-15 Pa), the target potential is much lower than the electron beam energy, offering the possibility of direct electron treatment of insulating materials. It is found that in the electron beam irradiation of a non-conducting target in a moderately high pressure range, the electron charge on the target surface is neutralized mainly by ions from a volume discharge established between the negatively charged target surface and the grounded walls of the vacuum chamber. This allows the possibility of direct electron beam treatment (heating, melting, welding) of ceramics and other non-conducting and semiconductor materials.

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Section: Experimental Set-up and Proceduresmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 97%