Homoepitaxial Mosaic Growth and Liftoff of Diamond Films

Pehrsson, Pehr E.; McCormick, T. L.; Alexander, W. B.; Marchywka, Mike; Black, David R.; Butler, James E.; Prawer, Steven

doi:10.1557/proc-416-51

Cited by 5 publications

(3 citation statements)

References 6 publications

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“…4 x 4 mm single crystal CVD plate (white/clear) is shown in relation to the HPHT seed diamond on which it was grown. This homoepitaxial crystal was separated from the seed crystal using a patented liftoff technique based on ion implantation, followed by growth, and then an electrochemical etch, 4 showing how high quality seed crystal can be reused multiple times.…”

Section: Single Crystal Cvd Diamondmentioning

confidence: 99%

Chemical Vapor Deposited Diamond: Maturity and Diversity

Butler¹

2003

Electrochem. Soc. Interface

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Section: Single Crystal Cvd Diamondmentioning

confidence: 99%

Chemical Vapor Deposited Diamond: Maturity and Diversity

Butler¹

2003

Electrochem. Soc. Interface

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“…This method has been proposed as an alternative to mechanical polishing for producing thin, uniform diamond membranes. 4,[10][11][12][13] Diamond membrane thickness is determined by the implantation energy and as the damage layer implants parallel to the top surface, the resulting membrane has a consistent thickness at all points. The lift off process is key to success of the diamond membrane nanofabrication process.…”

Section: Introductionmentioning

confidence: 99%

Diamond Membrane Production: The Critical Role of Radicals in the Non-Contact Electrochemical Etching of sp2 Carbon

Tully

Braxton

Cobb

et al. 2021

Preprint

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Sub-micrometre single crystal diamond membranes are of huge importance for next generation optical, quantum and electronic device applications. Electrochemical etching has proven a critical step in the production of such membranes. Etching is used to selectively remove a very thin layer of sub-surface sp2 bonded carbon, prepared by ion implantation in bulk diamond, releasing the diamond membrane. Due to the nanosized dimensions, etching is carried out using non-contact electrochemistry in low conductivity solutions (bipolar arrangement) which whilst effective, results in extremely slow etch rates. In this work, a new method of non-contact electrochemical etching is presented which uses high conductivity, high concentration, fully dissociated aqueous electrolytes. Careful choice of the electrolyte anion results in significant improvements in the sp2 carbon etch rate. In particular, we show both chloride and sulfate electrolytes increase etch rates significantly (up to ×40 for sulfate) compared to the current state-of-the-art. Electron paramagnetic resonance experiments, recorded after the electrode potential has been switched off, reveal sizeable hydroxyl radical concentrations at timescales > 10^7 longer than their lifetime (< microsecond). These measurements highlight the importance of electrochemically initiated, solution chemistry radical generation and regeneration pathways in high concentration sulfate and chloride solutions for nano-etching applications.

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“…This method has been proposed as an alternative to mechanical polishing for producing thin, uniform diamond membranes. 4,[10][11][12][13] Diamond membrane thickness is determined by the implantation energy and as the amorphise layer implants parallel to the top surface, the resulting membrane has a consistent thickness at all points. The lift off process is key to success of the diamond membrane nanofabrication process.…”

mentioning

confidence: 99%