Low thickness silver (Ag) coatings (thickness ∼25 nm) were fabricated by electron beam evaporation technique equipped with glancing angle deposition (GLAD, 86 • ) arrangement at varrying substrate heating temperatures (viz 30 • C, 75 • C, 125 • C and 150 • C). Although all the GLAD-Ag films prepared up to 125 • C temperature were found to be plasmonic in nature, the localized surface plasmon resonance (LSPR) band was more prominent at 125 • C and disappeared at 150 • C temperature. The dielectric contribution in the overall dispersion of sample structure was maximum for 125 • C with dominating metallic contribution observed for 150 • C. Detailed investigation of 125 • C deposited GLAD-Ag sample revealed sharpening of the LSPR band with reduction in film thickness. The ultra-thin coating (∼5 nm) was found to be purely dielectric in nature with the most prominent LSPR band among the others. Overall, the substrate heating temperature of 125 • C was found to be the threshold for fabricating plasmonic GLAD-Ag films with the best result observed for the ultra-thin (∼5 nm) specimen.