Honeycomb Texturing of Silicon Via Nanoimprint Lithography for Solar Cell Applications

Hauser, Hubert; Michl, Bernhard; Schwarzkopf, S.; Kübler, Volker; Müller, Christoph Michael; Hermle, Martin; Bläsi, Bénédikt

doi:10.1109/jphotov.2012.2184265

Cited by 59 publications

(44 citation statements)

References 16 publications

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“…Nanoimprintlithography has been identified as a promising technology for photovoltaics as it permits manifold degree of freedom to systematically control size and shape of the light trapping features at low fabrication costs [15][16][17][18][19][20]4]. The challenge is now to implement nanophotonic light management concepts into LPC silicon thinfilm solar cell devices maintaining the bulk material quality including a smart interface design.…”

Section: Introductionmentioning

confidence: 99%

Double-side textured liquid phase crystallized silicon thin-film solar cells on imprinted glass

Becker

Preidel

Amkreutz

et al. 2015

Solar Energy Materials and Solar Cells

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Section: Introductionmentioning

confidence: 99%

Double-side textured liquid phase crystallized silicon thin-film solar cells on imprinted glass

Becker

Preidel

Amkreutz

et al. 2015

Solar Energy Materials and Solar Cells

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“…NIL has been used to texture c-Si wafers with linear and crossed micron-scale gratings in this work. The process also has up-scaling potential, as shown by a recently developed NIL roller tool [9].…”

Section: Introductionmentioning

confidence: 99%

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Mellor¹,

Hauser²,

Wellens³

et al. 2013

Opt. Express

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Light trapping is becoming of increasing importance in crystalline silicon solar cells as thinner wafers are used to reduce costs. In this work, we report on light trapping by rear-side diffraction gratings produced by nano-imprint lithography using interference lithography as the mastering technology. Gratings fabricated on crystalline silicon wafers are shown to provide significant absorption enhancements. Through a combination of optical measurement and simulation, it is shown that the crossed grating provides better absorption enhancement than the linear grating, and that the parasitic reflector absorption is reduced by planarizing the rear reflector, leading to an increase in the useful absorption in the silicon. Finally, electrooptical simulations are performed of solar cells employing the fabricated grating structures to estimate efficiency enhancement potential.

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“…9 The following process chain is schematically visualized in Fig. 4(a) and single process steps are numbered for the sake of clarity.…”

Section: Single Step Definition Of Texturing Features and Contact Grimentioning

confidence: 99%

“…To meet these requirements, a Roller-NIL tooling intended for in-line highthroughput processing was developed and tested at Fraunhofer ISE. 9 The current study investigates the SmartNIL technology, as developed by EV Group. This technology is based on a UV-assisted NIL process using soft stamp materials.…”

Section: Introductionmentioning

confidence: 99%

Development of nanoimprint processes for photovoltaic applications

Hauser

Tucher

Tokai

et al. 2015

J. Micro/Nanolith. MEMS MOEMS

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Abstract. Due to its high resolution and applicability for large area patterning, nanoimprint lithography (NIL) is a promising technology for photovoltaic (PV) applications. However, a successful industrial application of NIL processes is only possible if large-area processing on thin, brittle, and potentially rough substrates can be achieved in a high-throughput process. The development of NIL processes using the SmartNIL technology from EV Group with a focus on PV applications is described. The authors applied this tooling to realize a honeycomb texture (8 μm period) on the front side of multicrystalline silicon solar cells, leading to an improvement in optical efficiency of 7% relative and a total efficiency gain of 0.5% absolute compared to the industrial standard texture (isotexture). On the rear side of monocrystalline silicon solar cells, the authors realized diffraction gratings to make use of light trapping effects. An absorption enhancement of up to 35% absolute at a wavelength of 1100 nm is demonstrated. Furthermore, photolithography was combined with NIL processes to introduce features for metal contacts into honeycomb master structures, which were initially realized using interference lithography. As a final application, the authors investigated the realization of very fine contact fingers with prismatic shape in order to minimize reflection losses.

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Honeycomb Texturing of Silicon Via Nanoimprint Lithography for Solar Cell Applications

Cited by 59 publications

References 16 publications

Double-side textured liquid phase crystallized silicon thin-film solar cells on imprinted glass

Double-side textured liquid phase crystallized silicon thin-film solar cells on imprinted glass

Nanoimprinted diffraction gratings for crystalline silicon solar cells: implementation, characterization and simulation

Development of nanoimprint processes for photovoltaic applications

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