Hot-embossing fabrication of chalcogenide glasses rib waveguide for mid-infrared molecular sensing

Abstract

Chalcogenide glasses have shown promise in fabricating mid infrared (MIR) photonic sensing devices due to their excellent optical properties in MIR. In addition, the glass transition temperature of chalcogenide glasses are generally low, making them ideal to create the high-throughput patterns of micro-scale structures based on hot embossing that is alternative to the standard lithographic technology. In this paper, we outline the research progress in the chalcogenide waveguide based on the hot embossing method, and discuss the problems remaining to be solved and the possible solutions.

Nonlinear optical properties of chalcogenide glass waveguides fabricated by hot melt smoothing and micro-trench filling

“…However, the residual organic solution in the solution-based method may cause high transmission loss, 21) and the fabrication process of nanoimprinting requires specialized equipment and precise experimental condition control. 22,23) In our previous work, we proposed and demonstrated a fabrication method for on-chip integrated ChG devices based on the material properties of low melting temperature and good flowability when they are melted. 24) The waveguide structures were realized by melting the ChG films and making ChG materials fill into micro-trenches.…”

Ultralow loss chalcogenide waveguide platform for mid-IR on-chip spectrometer applications

“…Among the different material options, chalcogenide glasses have emerged as the most suitable choice due to their wide transmission range and high index contrast, allowing for compact device footprints. However, after film deposition, chalcogenide-based waveguides often face challenges related to post-processing steps such as surface treatments (wet/dry etching) and polishing [1]. In this study, we utilized chalcogenide-on-silicon pedestal waveguides as a solution to overcome these challenges, eliminating the need for post-processing and polishing.…”

“…Despite the difficulties in the fabrication of integrated chalcogenide waveguides, several examples of fabricated platforms can be found in the literature [1,3,4,5]. In many of these examples, post chalcogenide layer deposition patterning was demonstrated, however, the fabrication process was very complex making it a very unattractive method.…”

GeAsSeTe/GeAsSe Pedestal Waveguides for Long-Wave Infrared Tunable on-Chip Spectroscopy

“…When working with chalcogenide layers, it is vital to avoid as much post-deposition processing as possible, as it is known that such layers are prone to chemically induced degradation. Common etchants, as well as the developers used during photolithography, are examples of chemicals that can cause significant damage to the deposited chalcogenide layers [14]. To avoid this, Si micromachining was used, through which Si pedestals were realized and used as the base for the subsequent optical layer deposition.…”