Humidity‐Responsive RGB‐Pixels via Swelling of 3D Nanoimprinted Polyvinyl Alcohol

Ko, Byoungsu; Kim, Jaekyung; Yang, Younghwan; Badloe, Trevon; Park, Jeonghoon; Ko, Joo Hwan; Jeong, Minsu; Kang, Hyunjung; Jung, Chunghwan; Song, Young Min; Rho, Junsuk

doi:10.1002/advs.202204469

Cited by 34 publications

(20 citation statements)

References 59 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Nanoimprint lithography (NIL) is a low-cost, high-throughput, and high-resolution patterning method that involves the use of a soft stamp. It has been actively researched by using various materials [33–37] and combining with different fabrication methods [38] . In NIL processes, a stamp consisting of inverse patterns replicates the desired patterns on a substrate by curing the resist with ultraviolet (UV) or heat.…”

Section: Soft Lithographymentioning

confidence: 99%

Emerging low-cost, large-scale photonic platforms with soft lithography and self-assembly

et al. 2023

Self Cite

View full text Add to dashboard Cite

.Advancements in micro/nanofabrication have enabled the realization of practical micro/nanoscale photonic devices such as absorbers, solar cells, metalenses, and metaholograms. Although the performance of these photonic devices has been improved by enhancing the design flexibility of structural materials through advanced fabrication methods, achieving large-area and high-throughput fabrication of tiny structural materials remains a challenge. In this aspect, various technologies have been investigated for realizing the mass production of practical devices consisting of micro/nanostructural materials. This review describes the recent advancements in soft lithography, colloidal self-assembly, and block copolymer self-assembly, which are promising methods suitable for commercialization of photonic applications. In addition, we introduce low-cost and large-scale techniques realizing micro/nano devices with specific examples such as display technology and sensors. The inferences presented in this review are expected to function as a guide for promising methods of accelerating the mass production of various sub-wavelength-scale photonic devices.

show abstract

Section: Soft Lithographymentioning

confidence: 99%

Emerging low-cost, large-scale photonic platforms with soft lithography and self-assembly

et al. 2023

Self Cite

View full text Add to dashboard Cite

show abstract

“…To achieve high print resolutions, nanoimprinting has been developed as it's suitable for easy and rapid manufacturing with high-resolution features, while it's generally limited to structures with dimensions no more than two and half. [21][22][23][24] Interference lithography also possesses similar advantages and is possible for 3D fabrication, but the pattern is not freely customized, and only limited forms of photonic crystals can be made. [25,26] 3D self-assembly assisted by nanopipette nozzle is promising for complex 3D printing, nevertheless the slow printing speed, weak mechanical stability of structures, and easy jam of the nozzle, hindering the usage for fast and multiscale fabrication.…”

Section: Introductionmentioning

confidence: 99%

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Wang

Zhang

Ladika

et al. 2023

Adv Funct Materials

115

View full text Add to dashboard Cite

The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced three-dimensional printing techniques, two-photon polymerization lithography (TPL) uniquely offers a significant electron microscope (SEM) images of SMP structures before and after programming and after recovery, respectively. Reproduced under terms of the CC-BY license. [114] Copyright 2021, The Authors, published by Nature Publishing Group. b) Stiff SMPs for high-resolution reversible nanophotonics. I-II) The deformed and recovered nanopillars under optical microscope and SEM, respectively. Reproduced with permission. [115] Copyright 2022, American Chemical Society. c) Vapor-responsive photonic arrays. I-IV) Optical image of a grid array in air, in water vapors ~ 20 s, saturation with water vapors ~ 88s, and after the gas flow stopped, respectively.Reproduced under terms of the CC-BY license. [116] Copyright 2021, The Authors, published by Royal Society of Chemistry. d) SEM image of a 40-layer face-cantered-cubic photonic structure printed by SU-8. Reproduced with permission. [117] Copyright 2004, Nature Publishing Group. e) SEM image of helices with an axial pitch of 800 nm and a radius of 800 nm fabricated by the two-step absorption photoresist. Reproduced with permission. [118]

show abstract

“…The high-index dielectric nanoantenna strongly interacts with impinging light to manipulate the optical properties. [1,8,14] Many applications such as metalens, [15][16][17] holography, [18][19][20][21] structural colors, [22,23] and polarization beam splitter [24,25] have been demonstrated. Moreover, compared with conventional single-function optical elements, metasurfaces can integrate multifunctions in one compact device.…”

Section: Introductionmentioning

confidence: 99%

Dielectric Metalens by Multilayer Nanoimprint Lithography and Solution Phase Epitaxy

Quan

Tang

et al. 2023

Adv Eng Mater

View full text Add to dashboard Cite

Metasurfaces have ushered in a huge development for their superior ability in manipulating light properties including phase, amplitude, and polarization, which show great potential as alternatives for the refractive optical devices. Recently, many applications of metasurface including metalens have been proposed and investigated, aiming at substituting their refractive counterparts. However, the commonly used fabrication approaches employ electron‐beam lithography (EBL) followed by dry etching or atomic layer deposition (ALD) of dielectric materials, which are expensive and inefficient. Besides, dry etching of dielectric materials at sub‐100 nm scale with a high aspect ratio is challenging. Herein, a new approach for dielectric metalens fabrication is presented, which combines multilayer nanoimprint lithography and solution phase epitaxy. High aspect ratio ZnO nanopillars with a height‐to‐diameter ratio of over 7:1 are demonstrated. By using the multilayer nanoimprint lithography, increased aspect ratio nanostructures from shallow imprinting molds are obtained. The highly anisotropic growth characteristic enables nanopillars to grow at a height that exceeds the resist thickness. With this ability, ZnO metalenses are fabricated where the height of nanopillar reaches 1.1 μm, achieving a focusing efficiency of 50%. The process is cost‐effective with a high throughput, which can be widely used for many optical applications.

show abstract

Humidity‐Responsive RGB‐Pixels via Swelling of 3D Nanoimprinted Polyvinyl Alcohol

Cited by 34 publications

References 59 publications

Emerging low-cost, large-scale photonic platforms with soft lithography and self-assembly

Emerging low-cost, large-scale photonic platforms with soft lithography and self-assembly

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

Dielectric Metalens by Multilayer Nanoimprint Lithography and Solution Phase Epitaxy

Contact Info

Product

Resources

About