2012
DOI: 10.1039/c2cp42115a
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Hybrid density functional study of band alignment in ZnO–GaN and ZnO–(Ga1−xZnx)(N1−xOx)–GaN heterostructures

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Cited by 47 publications
(36 citation statements)
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“…It can also be seen in Table III that the strain contribution is positive in all cases. Wang et al 9 found that the dipole contribution is almost independent of the functional used. This supports our approach of calculating the dipole at the LDA level, while the individual band edges in each material require the use of the GW corrections.…”
Section: Discussionmentioning
confidence: 99%
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“…It can also be seen in Table III that the strain contribution is positive in all cases. Wang et al 9 found that the dipole contribution is almost independent of the functional used. This supports our approach of calculating the dipole at the LDA level, while the individual band edges in each material require the use of the GW corrections.…”
Section: Discussionmentioning
confidence: 99%
“…Since these band-offsets also depend strongly on strain, a detailed comparison be-tween different results requires considering which strain state was assumed. For example, the results of Wang et al 9 correspond to a coherently strained interface. Since in strained GaN, the VBM is split, it increases the valence band offset.…”
Section: Discussionmentioning
confidence: 99%
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“…In this work, we evaluate both VB and CB offsets directly by the potential-line-up method [33][34][35] to provide an energy band alignment for α − β mixed-phase Ga 2 O 3 . Furthermore, the effect of the bonding network near the interface on the band offsets with the charge depletion layer is addressed, which is particular useful to determine the size of catalyst particles because the sizes should be essentially less than or equal to twice the width of the space charge region for the full extent of band bending.…”
Section: Introductionmentioning
confidence: 99%
“…20,21 For interface systems such as Si/SiO 2 , Ge/GeO 2 , and ZnO/GaN, the valence band offsets, which were underestimated by GGA, were shown to be improved by hybrid functional or QP calculations. 12,[40][41][42] On the other hand, for Si/HfO 2 and Si/ZrO 2 , both GGA and QP calculations well describe the valence band offsets due to the cancellation of many-body corrections in Si and oxide bulk systems. 10,43 In metal/oxide interfaces, hybrid or QP corrections will be larger for bulk HfO 2 and thus significantly modify the Schottky barrier height.…”
Section: Band Edge Corrections and Effective Work Functionmentioning
confidence: 89%