“…In addition, compared to the materials (e.g., TiO 2 , silicon nitride, and polymer) used in hybrid zero‐ χ (2) material/LN photonic waveguides, the GeSbS material has broad transparency to enable low propagation loss from the visible to the mid‐infrared region, large Kerr nonlinearity, considerable photoelastic coefficients, high damage threshold, and CMOS compatibility in fabrication. [ 39 ] ChG‐based photonic devices are prone to access due to the good adhesion of ChG thin films to various substrates via simple single‐source thermal evaporation and the mature techniques for producing ChG waveguides. [ 40–42 ] Different from the etching strategy of LN, the etching process of ChG involves both physical and chemical interactions, making it possible to obtain smooth and vertical waveguide sidewalls, which is critical for low propagation loss.…”