Hybrid inverse lithography techniques for advanced hierarchical memories

Xiao, Gao; Hooker, Kevin; Irby, Dave; Zhang, Yunqiang; Ward, Brian; Cecil, Tom; Hall, Brett M.; Lee, Mindy; Kim, Dave; Lucas, Kevin

doi:10.1117/12.2048022

Cited by 2 publications

(1 citation statement)

References 0 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…This is an open area of study and often ignored in small scale image processing and optimization research as it rears its head only when many templates are solved independently and stitched back together, revealing boundary mismatches. The periodic array solving approach 44 is able to recognize repeated designs and guarantee consistency of them, and other pattern matching solutions have been developed to attempt to identify all unique placements of all localized design variations within a full chip, but a robust, parallel-consistent, gradient based optimization algorithm is something that would be welcome in the mask synthesis community.…”

Section: Manufacturability Constraintsmentioning

confidence: 99%

Advances in Inverse Lithography

et al. 2022

View full text Add to dashboard Cite

As Moore’s law has marched forward, progressively shrinking chip designs at a consistent pace, the manufacturing of those chips has raced to keep up. Through advances in lithography hardware and software, we now are in the realm of the single-digit-nanometer design nodes at leading chip foundries. This paper will review the method of Inverse Lithography Technology (ILT), which is the preferred computational method for photolithography. Indeed photolithographic masks were the first metasurfaces, and still the most important metasurface, economically, used in memory chips, storage, and microprocessors. Moreover, photolithographic mask designers were the early adopters of the mathematical optimization in optics, creating ILT, specifying intended wafer patterns and metrics, and using the mathematical machinery of level sets, functional derivatives, and adjoints to drive the mask design process.

show abstract

Section: Manufacturability Constraintsmentioning

confidence: 99%