“…Nevertheless, several groups have adopted AIMD approaches to study the structure and chemistry of semiconductor-water interfaces for PEC applications. 198,201,[213][214][215][216][217][218][219][220][221][222][223][224][225] The presence of semiconductor surfaces often significantly alters the dynamical and chemical properties of water; conversely, the presence of the electrolyte can significantly alter the physiochemical properties of the semiconductor. Accordingly, recent simulations have reported a wide variety of complex chemical processes active at semiconductor surfaces when liquid water is included explicitly, such as water dissociative adsorption, 198,201,214,[216][217][218]221,222,224 surface hydroxylation and radical formation, 198,201,214,[216][217][218][219]221,223 unusual changes in the hydrogen-bond network, 198,201,[213][214][215][216][217][218][219][220] and fast sur...…”