1998
DOI: 10.1002/(sici)1521-3862(199812)04:06<235::aid-cvde235>3.0.co;2-r
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Hydrogen Chloride Effects on the CVD of Silicon Carbide from Methyltrichlorosilane

Abstract: A comprehensive experimental investigation of the effects of hydrogen chloride concentration on the deposition rate and stoichiometry of SiC films produced through thermal decomposition of methyltrichlorosilane (MTS, CH 3 SiCl 3 ) is carried out in a gravimetric hot wall reactor of tubular geometry. The study is conducted under subambient pressures and in the temperature range 1173-1473 K. Deposition rate measurements are carried out with HCl added to the MTS/H 2 feed mixture to simulate the depletion of gas p… Show more

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Cited by 24 publications
(21 citation statements)
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“…In agreement with the results of Fig. 6, a previous study, 30 conducted at subatmospheric pressures, showed that the silicon content of the film decreased with increasing HCl mole fraction in the feed. The results of past studies 19,30,44,45 showed that the deposition rate of SiC-based films decreases monotonically as the mole fraction of HCl in the feed stream increases.…”
Section: Resultssupporting
confidence: 92%
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“…In agreement with the results of Fig. 6, a previous study, 30 conducted at subatmospheric pressures, showed that the silicon content of the film decreased with increasing HCl mole fraction in the feed. The results of past studies 19,30,44,45 showed that the deposition rate of SiC-based films decreases monotonically as the mole fraction of HCl in the feed stream increases.…”
Section: Resultssupporting
confidence: 92%
“…The deposition rate can either decrease or increase (for reaction rate measurements between 5.5 and 9.8 cm) as the HCl concentration in the initial mixture increases; this implies that the qualitative effects of HCl addition in the reactive mixture (deposition rate increase or decrease) depend on the relative magnitude of the concentrations of deposition precursors and inhibitors at the location of the substrate. MTS is not the actual deposition precursor, 30,31 and, therefore, the inhibitory effect of HCl does not reflect competition between MTS and HCl at the deposition surface.…”
Section: Resultsmentioning
confidence: 99%
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