2008
DOI: 10.1063/1.2831495
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Hydrogen effusion from tritiated amorphous silicon

Abstract: Results for the effusion and outgassing of tritium from tritiated hydrogenated amorphous silicon (a-Si:H:T) films are presented. The samples were grown by dc-saddle field glow discharge at various substrate temperatures between 150 and 300°C. The tracer property of radioactive tritium is used to detect tritium release. Tritium effusion measurements are performed in a nonvacuum ion chamber and are found to yield similar results as reported for standard high vacuum technique. The results suggest for decreasing s… Show more

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Cited by 15 publications
(19 citation statements)
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“…11,19 Tritium effusion experiments were conducted in order to determine the atomic concentration in the samples and its bonding characteristics. 17,18 The detailed experimental setup and procedure have been described previously 17,18 and is briefly described here. The sample was mounted in a 1 L ionization chamber which was purged and then filled with argon gas at 800 Torr.…”
Section: Methodsmentioning
confidence: 99%
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“…11,19 Tritium effusion experiments were conducted in order to determine the atomic concentration in the samples and its bonding characteristics. 17,18 The detailed experimental setup and procedure have been described previously 17,18 and is briefly described here. The sample was mounted in a 1 L ionization chamber which was purged and then filled with argon gas at 800 Torr.…”
Section: Methodsmentioning
confidence: 99%
“…For all three samples, the low-temperature (LT) peak is located around 370 C and the high temperature (HT) peak is centered around 500 C, which agrees with previous effusion studies on tritiated hydrogenated amorphous silicon (aSi:H:T) prepared by the PECVD process. 2,17,18 The LT peaks suggest the existence of high order silicon tritides and tritium clusters, and the HT peak could be attributed predominantly to the Si-T monotritide bonds. 12,17 By comparing the fractional areas under both HT and LT peaks, it is estimated that around 70% of the tritium in a-Si:H films exists in the form of high order silicon tritides and tritium cluster.…”
Section: A Tritium Contentsmentioning
confidence: 99%
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“…The high-pressure tritium exposure apparatus used in this experiment is described elsewhere. 8 To study the stability of the tritiatied ScT x film, a thermal effusion measurement 10,11 was performed. Effusion data showed tritium outgassing from the samples beginning at approximately 250°C, the tritium loading temperature, while the majority of tritium evolution occurred near 600°C.…”
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confidence: 99%