We have investigated the H2 pressure-dependent (from vacuum to 20 bar) current-voltage characteristics of ZnO thin films prepared by spin coating method. The gas pressure effect on conductance (G) was subtracted using He gas. The G increased as applying 2 bar of H2 pressure, and then it monotonously decreased with the further increment of H2 pressure. Using X-ray diffraction patterns and X-ray photoelectron spectroscopy before and after H2 exposure, we found that the H2 spillover effect plays an important role in the variation of G of ZnO film.