2021
DOI: 10.1149/2162-8777/ac210d
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Hydrogenation of Boron Carbon Nitride Thin Films for Low-k Dielectric Applications

Abstract: The influence of hydrogenation on boron carbon nitride (BCN) thin films was investigated for low-k dielectric applications. The BCN thin films were deposited using radio-frequency magnetron sputtering in hydrogen, nitrogen, and argon ambiance. The hydrogen/nitrogen reactive gas flow was varied from 0/10 to 10/10 to achieve a varying range of hydrogen doping. Elemental composition and chemical bonding studies of the films were analyzed by X-ray photoelectron spectroscopy (XPS) and Fourier transform infrared spe… Show more

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“…N 1s spectrum of MBCN1 (Figure 3e) is deconvoluted into two contributions. The peak at 398.3 eV (39.6%) corresponds to the pyridinic nitrogen and NB bonds, [ 19,21 ] while the peak at 400.3 eV (60.4%) attributes to pyrrolic N. [ 19 ] It should be noted that the amount of pyrrolic N is decreased with the concomitant increase of NB as the content of the N is increased in the MBCN samples (Table S2, Supporting Information). The peak at 398.3 eV is slowly merged with the NB peak for MBCN3 and MBCN4.…”
Section: Resultsmentioning
confidence: 99%
“…N 1s spectrum of MBCN1 (Figure 3e) is deconvoluted into two contributions. The peak at 398.3 eV (39.6%) corresponds to the pyridinic nitrogen and NB bonds, [ 19,21 ] while the peak at 400.3 eV (60.4%) attributes to pyrrolic N. [ 19 ] It should be noted that the amount of pyrrolic N is decreased with the concomitant increase of NB as the content of the N is increased in the MBCN samples (Table S2, Supporting Information). The peak at 398.3 eV is slowly merged with the NB peak for MBCN3 and MBCN4.…”
Section: Resultsmentioning
confidence: 99%