2008
DOI: 10.1088/0960-1317/18/5/055019
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Hydrophobic coating of microfluidic chips structured by SU-8 polymer for segmented flow operation

Abstract: We present a hydrophobization procedure for SU-8-based microfluidic chips on borofloat substrates. Different layouts of gold electrodes passivated by the polymer have been investigated. The chips are used for segmented flow in a two-fluid mode that requires a distinct hydrophobicity of the channel walls which is generated by the use of specific silane. In this paper we describe the production and silanization of the chips and demonstrate segmented flow operation.

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Cited by 20 publications
(14 citation statements)
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“…7(b) inset. This finding means that fewer charges were injected from the SWNTs to the SU-8 surface since SU-8 has hydrophobic surface properties [25], and there was no moisture on the surface of the SWNTs after SU-8 coating on top of the SWNT TFT channel. The calculated device mobilities were 26.9 cm 2 /Vs for the bottom gating and 27.0 cm 2 /Vs for the top gating, and, as shown, there was no change in the intrinsic properties of the SWNTs after SU-8 coating.…”
Section: November 2010mentioning
confidence: 97%
“…7(b) inset. This finding means that fewer charges were injected from the SWNTs to the SU-8 surface since SU-8 has hydrophobic surface properties [25], and there was no moisture on the surface of the SWNTs after SU-8 coating on top of the SWNT TFT channel. The calculated device mobilities were 26.9 cm 2 /Vs for the bottom gating and 27.0 cm 2 /Vs for the top gating, and, as shown, there was no change in the intrinsic properties of the SWNTs after SU-8 coating.…”
Section: November 2010mentioning
confidence: 97%
“…A suitable photoresist for structuring fluidic microchannels on wafer substrates is the biocompatible and chemically inert epoxy SU8, which develops vertical sidewalls of micrometer height on glass or silicon wafers [ 150,151 ]. The SU8 photoresist can be spun onto the wafer substrate using spin-coater at a speed that achieves specific thickness, under certain viscosity value and specific hydrophobic surface.…”
Section: Etching Proceduresmentioning
confidence: 99%
“…A suitable photoresist for structuring fluidic microchannels on wafer substrates is the biocompatible and chemically inert epoxy SU8, which develops vertical sidewalls of micrometer height on glass or silicon wafers [7,8]. Solidifying one SU8 formation against another by crosslinking the opposing SU8 layers, it is viable to produce microchannels.…”
Section: Etching Proceduresmentioning
confidence: 99%