Hyperthermal atomic oxygen beam-induced etching of HOPG (0001) studied by X-ray photoelectron spectroscopy and scanning tunneling microscopy

Kinoshita, Hiroshi; Umeno, Masayoshi; Tagawa, Masatoshi; Ohmae, Nobuo

doi:10.1016/s0039-6028(99)00771-2

Cited by 61 publications

(70 citation statements)

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“…Postexposure characterization of room-temperature HOPG subjected to hyperthermal O and O 2 bombardment revealed that C−O, CO, or O−C−O and O−CO functional groups populated the surface. 24 In the same study, scanning tunneling microscopy studies showed that the surface became rough and formed hillock-like structures. Nicholson, Minton, and Sibener conducted a series of experiments that studied the chemical reactivity of HOPG in the range of 300− 500 K when exposed to higher fluences of hyperthermal O atoms.…”

Section: Introductionmentioning

confidence: 86%

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces

et al. 2015

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We have undertaken a series of experiments to learn the mechanisms of carbon oxidation over a wide range of temperatures that extend to the conditions encountered during atmospheric re-entry, with a particular interest in understanding how these mechanisms change with temperature. We report here the hyperthermal scattering dynamics of ground-state atomic oxygen, O( 3 P), and molecular oxygen, O 2 ( 3 Σ g − ), on vitreous carbon surfaces at temperatures from 600 to 2100 K. A molecular beam containing neutral O and O 2 in a mole ratio of 0.93:0.07 was prepared with a nominal velocity of 7760 m s −1 , corresponding to a translational energy of 481 kJ mol −1 for atomic oxygen. This beam was directed at a vitreous carbon surface, and angular and translational energy distributions were obtained for inelastically and reactively scattered products with the use of a rotatable mass spectrometer detector. Unreacted oxygen atoms exited the surface through both impulsive scattering and thermal desorption. The preferred scattering process changed from impulsive scattering to thermal desorption as the surface temperature increased. O 2 scattered mainly impulsively from the surface, and its scattering dynamics were essentially unaffected by surface temperature. The predominant reactive product was carbon monoxide (CO). Carbon dioxide (CO 2 ) was also formed at lower surface temperatures. The flux of the CO product rose with temperature to a maximum at approximately 1500−1900 K, depending on heating rate, and then decreased with increasing surface temperature. The CO 2 flux dropped dramatically with increasing surface temperature and was below detectable limits above 1100 K. A minor reactive pathway was identified that produced O 2 , presumably through a direct Eley−Rideal reaction of an incident oxygen atom with an O atom residing on the surface. Decreased oxygen surface coverage at higher temperatures was found to limit the reactivity of the surface by inhibiting the production of CO and CO 2 at very high surface temperatures. The observed inelastic and reactive scattering behavior reveals a complex interplay between reactivity and surface temperature.

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Section: Introductionmentioning

confidence: 86%

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces

et al. 2015

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“…Fig. 2 (b) shows O/C atomic ratios of the When a flat graphite surface is fully covered (one monolayer) with adsorbed oxygen, O/C ratio of the surface is estimated to be approximately 55 % [9]. This value is almost two times higher than that of the superhydrophilic HOPG surface.…”

Section: Introductionmentioning

confidence: 94%

“…Previously the basal plane of highly oriented pyrolytic graphite (HOPG) surface was exposed to a hyperthermal oxygen-atom beam and the direct oxidation on defect-free graphite basal planes was observed [9]. It is possible that the effect of basal plane oxidation to improve hydrophilicity on nano-rough carbon surfaces is investigated by hyperthermal O-atom beam exposure.…”

Section: Introductionmentioning

confidence: 99%

Superhydrophilicity on nano-rough carbon surfaces achieved by hyperthermal oxygen-atom beam exposure

Kinoshita

Nakayama

Matsumoto

et al. 2011

Carbon

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Section: -Toward a High Throughput Process-mentioning

confidence: 99%

“…After the He/H 2 plasma pretreatment, the binding energy observed at 284.1 eV corresponds to that of HOPG which is composed of sp 2 bonding. [40][41] These were confirmed as amorphous sp 2 carbon films from the Raman spectrum.The difference between the effect of He/H 2 and Ar/H 2 plasma pretreatment methods can be attributed to the difference between the sputtering yields of SiO 2 for helium and argon.In the case of surface-wave plasma CVD, high-density plasma is excited in the vicinity of the quartz window, and the mixing of silicon and oxygen with the plasma by the sputtering of the quartz window is a major issue. That is, it is necessary to suppress the deposition of such impurities onto the substrate.…”

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confidence: 99%

High quality and large-area graphene synthesis with a high growth rate using plasma-enhanced CVD

Hasegawa

Tsugawa²,

Kato³

et al. 2016

Synthesiology English edition

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attempt to develop high throughput plasma-enhanced CVD for high quality graphene.[8]- [16] 2 Preparation of a substrate for graphene synthesis and suppression of impurity incorporation.In the case of CVD of graphene using a copper foil substrate, surface cleaning technique of copper foil before CVD is especially important. Also in the case of plasma-assisted CVD (plasma CVD), it is necessary to prevent contamination such as impurities released from the reaction chamber by plasma exposure, particularly silicon, which originate from the quartz of antenna units for exciting plasma.Commercially available copper foil surfaces are subjected to anticorrosive treatment in order to prevent oxidation. Moreover, even foil with anticorrosive treatment has a surface that is still covered with a thin copper oxide layer. For high-quality graphene synthesis, it is necessary to remove these copper oxide and anticorrosive treatment carefully. In thermal CVD of graphene, electrolytic cleaning and successive high-temperature treatment at about 1000 °C of the copper foil substrate in the reaction chamber are effective for removing copper oxide and the anticorrosive treatment layer. Furthermore, in order to flatten the copper foil surface, chemical polishing (CMP) before electrolytic cleaning and annealing treatment is effective.[17] [18] On the other hand, electrolytic cleaning is a wet process and thus there is a possibility of recontamination before CVD. Therefore, cleaning methods consistent with CVD are desirable. IntroductionGraphene [1] is a single atomic sheet in which carbon atoms are arranged in a hexagonal honeycomb lattice. Graphene has a very unique band structure (zero bandgap, linear dispersion), and thereby it shows brilliant electronic and optical characteristics such as extremely high carrier mobility and light absorption which does not depend on wavelength. (2.3 % absorption per layer.) Moreover graphene has the property of flexibility which indium tin oxide (ITO) [2] does not possess, and an attempt has been made to use a few layers of graphene(FLG) as transparent electrodes in such devices as flexible organic light-emitting diode (OLED), solar batteries, and displays.For transparent electrode application of graphene, it is necessary to establish production technology of high quality and high throughput for large area graphene. Among the various methods of graphene production such as mechanical exfoliation of bulk graphite, [1][3] exfoliation of graphene oxide in liquid phase, [4] thermal decomposition of SiC, [5] etc., chemical vapor deposition (CVD) on catalytic transition metal surfaces, in particular on a copper surface, has great promise as a production method for transparent electrode application. Recently, high conductivity graphene has been synthesized on copper substrates by energetic development of the thermal CVD method.[6] [7] On the other hand, since throughput of the thermal CVD method is insufficient, synthesis time needs to be significantly shortened for transparent electrode application. In this p...

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Hyperthermal atomic oxygen beam-induced etching of HOPG (0001) studied by X-ray photoelectron spectroscopy and scanning tunneling microscopy

Cited by 61 publications

References 18 publications

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces

Superhydrophilicity on nano-rough carbon surfaces achieved by hyperthermal oxygen-atom beam exposure

High quality and large-area graphene synthesis with a high growth rate using plasma-enhanced CVD

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Hyperthermal atomic oxygen beam-induced etching of HOPG (0001) studied by X-ray photoelectron spectroscopy and scanning tunneling microscopy

Cited by 61 publications

References 18 publications

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O2 on Hot Vitreous Carbon Surfaces

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O2 on Hot Vitreous Carbon Surfaces

Superhydrophilicity on nano-rough carbon surfaces achieved by hyperthermal oxygen-atom beam exposure

High quality and large-area graphene synthesis with a high growth rate using plasma-enhanced CVD

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Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces

Inelastic and Reactive Scattering Dynamics of Hyperthermal O and O₂ on Hot Vitreous Carbon Surfaces