Atomic oxygen (AO) attacks carbon-fiber
reinforcing polymers on
the surfaces of spacecraft in low Earth orbit and threatens safe spacecraft
operation and service life. Incorporating phenylphosphine oxide (PPO)
groups into polymer chains offers a self-regenerating method of protection
from AO but remains poorly understood. Herein, epoxies containing
PPO groups were synthesized with increasing concentrations of phosphorus
[P] from 0 to 8 wt % to investigate their AO resistance. Thin films
of PPO-containing epoxies were exposed to AO via oxygen plasma etching
and characterized by interferometry, X-ray photoelectron spectroscopy,
and atomic force microscopyinfrared spectroscopy. Measurements
confirmed that the exposure of these materials to AO produces a passivation
phosphate (PO
x
) layer on the surface of
the sample, resulting in up to 100X decrease in AO erosion rates.
Furthermore, key insights into the relationship between initial [P],
passivation layer surface topology, and polymer depth profiles were
obtained. Crucially, the results indicate that these materials advantageously
did not exhibit linear erosion rates when exposed to AO, in contrast
to most organic polymers, and their AO resistance can be readily tuned
via synthetic incorporation of monomers with varying [P].