Weaker
Fermi level pinning (FLP) at the Schottky barriers of 2D
semiconductors is electrically desirable as this would allow a minimizing
of contact resistances, which presently limit device performances.
Existing contacts on MoS
2
have a strong FLP with a small
pinning factor of only ∼0.1. Here, we show that Moire interfaces
can stabilize physisorptive sites at the Schottky barriers with a
much weaker interaction without significantly lengthening the bonds.
This increases the pinning factor up to ∼0.37 and greatly reduces
the n-type Schottky barrier height to ∼0.2 eV for certain metals
such as In and Ag, which can have physisorptive sites. This then accounts
for the low contact resistance of these metals as seen experimentally.
Such physisorptive interfaces can be extended to similar systems to
better control SBHs in highly scaled 2D devices.