The
dynamics of the graphene–catalyst interaction during
chemical vapor deposition are investigated using in situ, time- and
depth-resolved X-ray photoelectron spectroscopy, and complementary
grand canonical Monte Carlo simulations coupled to a tight-binding
model. We thereby reveal the interdependency of the distribution of
carbon close to the catalyst surface and the strength of the graphene–catalyst
interaction. The strong interaction of epitaxial graphene with Ni(111)
causes a depletion of dissolved carbon close to the catalyst surface,
which prevents additional layer formation leading to a self-limiting
graphene growth behavior for low exposure pressures (10–6–10–3 mbar). A further hydrocarbon pressure
increase (to ∼10–1 mbar) leads to weakening
of the graphene–Ni(111) interaction accompanied by additional
graphene layer formation, mediated by an increased concentration of
near-surface dissolved carbon. We show that growth of more weakly
adhered, rotated graphene on Ni(111) is linked to an initially higher
level of near-surface carbon compared to the case of epitaxial graphene
growth. The key implications of these results for graphene growth
control and their relevance to carbon nanotube growth are highlighted
in the context of existing literature.