2016
DOI: 10.1063/1.4968803
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In-situ observation of self-cleansing phenomena during ultra-high vacuum anneal of transition metal nitride thin films: Prospects for non-destructive photoelectron spectroscopy

Abstract: Self-cleansing of transition metal nitrides is discovered to take place during ultra-high vacuum annealing of TiN, NbN, and VN thin films. Native oxide layers from air exposure disappear after isothermal anneal at 1000 degrees C. Also, for TiN, the Ti 2p and N 1s X-ray photoelectron spectra (XPS) recorded after the anneal are identical to those obtained from in-situ grown and analyzed epitaxial TiN(001). These unexpected effects are explained by oxide decomposition in combination with N-replenishing of the nit… Show more

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Cited by 31 publications
(12 citation statements)
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“…Such contacts remain within the Schottky–Mott limit, in which the electronic levels of the adsorbate are determined by the work function of the substrate . As a matter of fact, the process of AdC adsorption is also classified as physical, because the principal species (hydrocarbons) are not chemically reactive and can be readily desorbed by a gentle anneal in vacuum . In the present case, the potential interaction between AdC species and (TM)N film is further suppressed by the presence of a native oxide layer.…”
Section: Figurementioning
confidence: 83%
“…Such contacts remain within the Schottky–Mott limit, in which the electronic levels of the adsorbate are determined by the work function of the substrate . As a matter of fact, the process of AdC adsorption is also classified as physical, because the principal species (hydrocarbons) are not chemically reactive and can be readily desorbed by a gentle anneal in vacuum . In the present case, the potential interaction between AdC species and (TM)N film is further suppressed by the presence of a native oxide layer.…”
Section: Figurementioning
confidence: 83%
“…5b 34.75% of carbon. The presence of carbon is expected as a result of carbon accumulation on the surface upon air exposure [57,58]. Table S2 (supplementary data) lists the atomic percentages of all recorded elements in the deposited film with their valence and atomic radii.…”
Section: Chemical Compositionmentioning
confidence: 99%
“…Finally, we observe the Ti 2p XPS spectra at 82 s (position 4), as shown in Figure 1e. The peaks of Ti 2p 3/2 and Ti 2p 1/2 are respectively centered at about 454.9 eV and 461 eV for the TiN bottom electrode [33].…”
Section: Resultsmentioning
confidence: 99%