In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

Abstract

In order to better characterize the development of the electron-beam resist hydrogen silsesquioxane (HSQ), we used a quartz crystal microbalance (QCM) to study its rate of dissolution in situ. We determined the effect of both salt concentration and applied electric potential on the development rate of HSQ. The development rates were measured by spinning HSQ directly onto a quartz crystal resonator, and then developing in a QCM microfluidic module. In order to more directly observe the effect of electric potentials on HSQ development rate, a film of HSQ was partially cross-linked in an O 2 plasma asher then developed in the QCM flow module with a salt-free NaOH solution. As the partially cross-linked HSQ slowly developed, electric potentials were applied and removed from the Preprint: manuscript under review 2 crystal allowing us to observe how the development rate increased upon the application of a positive electric potential. The increased development rate caused by both the addition of salt ions and a positive electric potential suggests that the rate may be limited by a build-up of negative charge on the HSQ.

Analysis of dissolution kinetics of narrow polydispersity poly(4-hydroxystyrene) in alkaline aqueous solution using machine learning

“…The steps of the dissolution process for resists, including CARs, have been widely investigated by various methods, such as visible and infrared reflectance spectroscopy, [10][11][12] use of a quartz crystal microbalance (QCM), [12][13][14][15][16][17][18][19] high-speed atomic force microscopy, [20][21][22][23][24] and other methods. The dissolution is roughly divided into three steps: 12,18,19,25,26) the diffusion of solvent molecules into the polymer bulk and its subsequent swelling, the reaction between the polymer and the solvent molecules, and the diffusion of the polymer chain into the solvent bulk.…”

Relationship between C=C double bond conversion and dissolution kinetics in cross-linking-type photoresists for display manufacture, studied by real-time Fourier transform infrared spectroscopy and quartz crystal microbalance methods

“…In particular, the development process of photoresists is essential because it significantly affects the resist pattern formation. The development process has been investigated by various methods such as visible and infrared reflectance spectroscopy, [6][7][8] a quartz crystal microbalance (QCM) method, [8][9][10][11][12][13][14] and high-speed atomic force microscopy (AFM). [15][16][17][18][19] The dependences of the development process on exposure dose (reaction rate), 6,9) molecular structure, 8,11,14) film thickness, 14,16) acidity, 8,11,14,20,21) and pattern shape 17) have been reported.…”

Dissolution behavior of negative-type photoresists for display manufacture studied by quartz crystal microbalance method

“…Dissolution processes have been investigated by visible and infrared reflectance spectroscopy, [6][7][8] a quartz crystal microbalance (QCM), [8][9][10][11][12][13] high-speed atomic force microscopy (AFM), [14][15][16][17][18] Rutherford backscattering spectrometry, 19) simulation, [20][21][22][23][24] and other methods. 25,26) The dissolution kinetics and its dependence on the exposure dose (reaction rate), 6,9) molecular structure, 8,11) film thickness, 15) acidity, 8,11,26) and pattern shape 16) have been widely studied.…”