“…Up to now, numerous techniques have been used to deposit LiNbO 3 thin films, including sputtering [2,3], liquid-phase epitaxy (LPE) [4], sol-gel process [5,6], metal organic chemical vapor deposition (MOCVD) [7,8] and pulsed laser deposition (PLD) [9][10][11][12][13]. Among these techniques, PLD has been shown to be very appropriate for the complex oxide films deposition due to its intrinsic feature of easily transferring the target stoichiometry to the substrate.…”