The time-dependent plasma discharge ionization region model (IRM) has been under continuous development during the past seven years and used in several studies of the ionization region of high-power impulse magnetron sputtering (HiPIMS) discharges. In the present work, a complete description of the most recent version of the IRM is given, which includes improvements, such as allowing for returning of the working gas atoms from the target, a separate treatment of hot secondary electrons, addition of doubly charged metal ions, etc. To show the general applicability of the IRM, two different HiPIMS discharges are investigated. The first set concerns 400 µs long discharge pulses applied to an Al target in an Ar atmosphere at 1.8 Pa. The second set focuses on 100 µs long discharge pulses applied to a Ti target in an Ar atmosphere at 0.54 Pa, and explorers the effects when varying the magnetic field strength. The model results show that Al 2+-ions contribute negligibly to the production of secondary electrons, while Ti 2+-ions effectively contribute to the production of secondary electrons. Similarly, the model results show that for an argon discharge with Al target the contribution of Al +-ions to the discharge current is over 90 % at 800 V, while Al +-ions and Ar +-ions contribute roughly equally to the discharge current at 400 V. For high currents the discharge with Al target develops almost pure self-sputter recycling, while the discharge with Ti target exhibits close to a 50/50 combination of self-sputter recycling and working gas-recycling. For a Ti target, a self-sputter yield significantly below unity makes working gas-recycling necessary at high currents. In the discharge with Ti target the B-field was reduced in steps from the nominal value, which resulted in a corresponding stepwise increase in the discharge resistivity.