2013
DOI: 10.1016/j.ceramint.2012.07.031
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Identification and quantification of reaction phases at Si3N4–Ti interfaces by using analytical transmission electron microscopy techniques

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Cited by 15 publications
(7 citation statements)
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“…Similar to our former research [25], after heat treatment at 1000 ℃, we also observed nearly uniform phase structures like performed previous studies [18,19,[36][37][38][39][40]. However, it can be explained that primary microstructure was consisted of Ti 3 N 2 reaction layer with 50 nm thickness at the interface, dendritic shape Ti 2 N phase instead of Ti 3 N formation along the whole Ti interlayer and Si rich Ti x Si y N phases.…”
Section: Discussionsupporting
confidence: 91%
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“…Similar to our former research [25], after heat treatment at 1000 ℃, we also observed nearly uniform phase structures like performed previous studies [18,19,[36][37][38][39][40]. However, it can be explained that primary microstructure was consisted of Ti 3 N 2 reaction layer with 50 nm thickness at the interface, dendritic shape Ti 2 N phase instead of Ti 3 N formation along the whole Ti interlayer and Si rich Ti x Si y N phases.…”
Section: Discussionsupporting
confidence: 91%
“…Considering the EFTEM maps, Si and N diffusion towards Ti foil side was detected. Here, effect of heat treatment on the enhancing of diffusion rate in both Si and N elements was obviously seen when compared to our former research [25]. Similar to TEM and STEM images (Fig.…”
Section: Resultssupporting
confidence: 84%
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“…On the other hand, the spatial distribution of Ti and N can be well differentiated by EELS through detecting the ionization edges of Ti L-edge (485 eV) and N-K edge (401 eV). [128]. The width of the energy windows ∆E of carbon, nitrogen and titanium was set to be 10 eV.…”
Section: Carbon Coated Tinmentioning
confidence: 99%