2015
DOI: 10.1016/j.jallcom.2015.07.198
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Identification of N–H related acceptor defects in GaAsN grown by chemical beam epitaxy using hydrogen isotopes

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Cited by 2 publications
(1 citation statement)
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“…21,22) The N-H-related defects were also confirmed in GaNAs grown by chemical beam epitaxy (CBE) and considered as acceptors according to deep-level transient spectroscopy (DLTS). [23][24][25][26] The result means that N-H-related defects can contribute to the background carrier concentration (BGCC), which is one of the reasons for the degradation of GaInNAs solar cells. To quantitatively evaluate the BGCC and other effects of N-Hrelated defects on the properties of GaInNAs solar cells, the growth technology should have hardly any impurity (such as carbon in CBE, acting as BGCC as well) to avoid interference.…”
Section: Introductionmentioning
confidence: 99%
“…21,22) The N-H-related defects were also confirmed in GaNAs grown by chemical beam epitaxy (CBE) and considered as acceptors according to deep-level transient spectroscopy (DLTS). [23][24][25][26] The result means that N-H-related defects can contribute to the background carrier concentration (BGCC), which is one of the reasons for the degradation of GaInNAs solar cells. To quantitatively evaluate the BGCC and other effects of N-Hrelated defects on the properties of GaInNAs solar cells, the growth technology should have hardly any impurity (such as carbon in CBE, acting as BGCC as well) to avoid interference.…”
Section: Introductionmentioning
confidence: 99%