Ignition and burning of vacuum arcs on tungsten layers

Laux, M.; Schneider, W.; Jüttner, B.; Balden, M.; Lindig, S.; Beilis, I. I.; Djakov, B. E.

doi:10.1109/deiv.2004.1418653

Cited by 3 publications

(2 citation statements)

References 14 publications

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“…The cathode spot is particularly suitable for generating plasma comprised of refractory metallic elements (i.e., with high melting temperatures and low equilibrium vapor pressure), such as W, Nb, C, Ti, Zr, and Ta, which can then be deposited as thin films and coatings. Refractory films have been used for investigating arcing in tokamaks (on tungsten coated graphite) [8], reaction of Ti, Nb, W, Zr, and Mo films (deposited by RF sputtering) with Al 2 O 3 (motivated by microelectronics applications) [9], and properties of metal containing diamond-like carbon coatings [(Ti, Nb, and W)-DLC] deposited by magnetron sputtering [10]. Hoffman and Thornton [11] presented data for films up to 0.3-µm thick sputtered onto glass substrates at a nominal deposition rate of 1 nm/s over the pressure range 0.067-4.0 Pa of argon.…”

Section: Introductionmentioning

confidence: 99%

Thin-Film Deposition With Refractory Materials Using a Vacuum Arc

Beilis

Koulik

Yankelevich

et al. 2015

IEEE Trans. Plasma Sci.

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Refractory metal plasma generated by a vacuum arc was used to deposit thin films with different arc currents I. The deposition rate V dep was measured for electrode configurations including a planar Zr cathode and a planar W anode; cylindrical W or Mo electrode pairs and a cylindrical Nb cathode closed by a BN plate and a W or Nb shower-head cup anode or with one-hole Ta cup anode. V dep for a Mo electrode pair with I = 275 A at a distance L = 110 mm from the electrode axis reached 2.2 µm/min, 60 s after arc ignition. For the W electrode pair V dep was ∼1 µm/min at 80 s (I = 200 A and L = 110 mm), while for W film deposition with shower-head anode V dep was ∼0.6 µm/min (I = 200 A and L = 60 mm). For Nb films deposited with the closed electrode configuration, V dep was 0.3 µm/min at 30 s after arc ignition (I = 275 A and L = 80 mm from the anode front).Index Terms-Metallic plasma, refractory electrode, thin film, vacuum arc.

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Section: Introductionmentioning

confidence: 99%

Thin-Film Deposition With Refractory Materials Using a Vacuum Arc

Beilis

Koulik

Yankelevich

et al. 2015

IEEE Trans. Plasma Sci.

View full text Add to dashboard Cite

show abstract

“…This feature allows to determine the instantaneous values of the electron temperature. However, the applicability of this method in the strongly magnetized plasma has some uncertainties [3] which can lead to significant errors.…”

Section: Introductionmentioning

confidence: 99%