II. The energy spectrum of ejected atoms during the high energy sputtering of gold

Thompson, M. W.

doi:10.1080/14786436808227358

Cited by 1,166 publications

(226 citation statements)

References 24 publications

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“…At low pressure, sputtered particles are likely to experience no collisions before arriving at the substrate, and their energy distribution is approximately described by a Thompson distribution [9,10], which has a maximum at 2 SB E and a tail 2 E − , with SB E being the surface binding energy.…”

Section: A Brief (And Necessarily Incomplete) Review Of Structure Zonmentioning

confidence: 99%

A structure zone diagram including plasma-based deposition and ion etching

2010

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An extended structure zone diagram is proposed that includes energetic deposition, characterized by a large flux of ions typical for deposition by filtered cathodic arcs and high power impulse magnetron sputtering. The axes are comprised of a generalized homologous temperature, the normalized kinetic energy flux, and the net film thickness, which can be negative due to ion etching. It is stressed that the number of primary physical parameters affecting growth by far exceeds the number of available axes in such a diagram and therefore it can only provide an approximate and simplified illustration of the growth condition-structure relationships.

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Section: A Brief (And Necessarily Incomplete) Review Of Structure Zonmentioning

confidence: 99%

A structure zone diagram including plasma-based deposition and ion etching

2010

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“…For atomic ions, the well established collision cascade theory [10,11] gives the intensity I(E) for a kinetic energy, E, with a surface binding energy, U, of…”

Section: Characterization Of a Single Stage Reflection Mass Analyzermentioning

confidence: 99%

TOF-SIMS: Accurate mass scale calibration

Green

Gilmore

Seah

2006

J. Am. Soc. Mass Spectrom.

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A study is presented of the factors affecting the calibration of the mass scale in time-of-flight secondary ion mass spectrometry (TOF-SIMS). At the present time, TOF-SIMS analysts using local calibration procedures achieve a rather poor relative mass accuracy of only 150 ppm for large molecules (647 u) whereas for smaller fragments of Ͻ200 u this figure only improves to 60 ppm. The instrumental stability is 1 ppm and better than 10 ppm is necessary for unique identification of species. The above experimental uncertainty can lead to unnecessary confusion where peaks are wrongly identified or peaks are ambiguously assigned. Here we study, in detail, the instrumental parameters of a popular single stage reflection TOF-SIMS instrument with ion trajectory calculations using SIMION. The effect of the ion kinetic energy, emission angle, and other instrumental operating parameters on the measured peak position are determined. This shows clearly why molecular and atomic ions have different relative peak positions and the need for an aperture to restrict ions at large emission angles. These data provide the basis for a coherent procedure for optimizing the settings for accurate mass calibration and rules by which calibrations for inorganics and organics may be incorporated. This leads to a new generic set of ions for mass calibration that improves the mass accuracy in our interlaboratory study by a factor of 5. A calibration protocol is developed, which gives a relative mass accuracy of better than 10 ppm for masses up to 140 u. The effects of extrapolation beyond the calibration range are discussed and a recommended procedure is given to ensure that accurate mass is achieved within a selectable uncertainty for large molecules. Additionally, we can alternatively operate our instrument in a regime with good energy discrimination (i.e., poor energy compensation) to study the fragmented energies of molecules. This leads to data that support previous concepts developed in G-SIMS. tatic SIMS (SSIMS) is a powerful technique for the analysis of organic and molecular surfaces. Over the last decade, instrumentation has improved significantly so that modern instruments now have very high reliability. Together with reference procedures and methods, the intensity repeatability has improved by over a factor of 10. In a recent VAMAS interlaboratory study [1] conducted by NPL, over 84% of instruments exhibited excellent intensity repeatabilities of better than 1.9%. It was also demonstrated that the comparability of relative ion intensities between different instrument designs can be Ͻ4% by incorporation of the concept of the relative instrument spectral response (RISR) function [1].A significant issue for many analysts is establishing an accurate calibration of the mass scale for time-of-flight (TOF) instruments. In a recent ISO [2] survey of needs for standardization in static SIMS, analysts ranked a procedure for mass calibration as the top priority. Typically, this needs to be conducted for each spectrum since small variations in t...

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“…It is reasonable approximation that we neglect the effect of the inelastic energy loss in eq. (1). Furthermore, the recoil energy T in eq.…”

Section: Theorymentioning

confidence: 99%

“…Information on the energy of sputtered atoms is indispensable to the analyses of impurity transport in boundary plasma and of the screening effect of a scrape-off layer. Thus far, the Thompson formula [1] has been employed widely for such purposes. This formula was derived assuming that sputtered atoms come from a well-developed collision cascade in a material.…”

Section: Introductionmentioning

confidence: 99%

A New Formula for Energy Spectrum of Sputtered Atoms Due to Low-Energy Light Ions

Kondo

Yamamura

Ono

et al. 2004

J. Plasma Fusion Res.

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A new formula has been derived to describe the energy spectrum of sputtered atoms from a target material bombarded by light ions. We assume that sputtered atoms bombarded by low-energy light ions are mainly primary knock-on atoms which are created by large-angle backscattered light ions. The escape processes of recoil atoms are estimated on the basis of the Falcone-Sigmund model. The new formula has the dependence on the incident energy of a projectile. We have compared the new formula with simulation results calculated with ACAT code for a Fe target material bombarded by 50 eV, 100 eV and 500 eV D + ions. Good agreements are found for 50 eV and100 eV D + ions.

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II. The energy spectrum of ejected atoms during the high energy sputtering of gold

Cited by 1,166 publications

References 24 publications

A structure zone diagram including plasma-based deposition and ion etching

A structure zone diagram including plasma-based deposition and ion etching

TOF-SIMS: Accurate mass scale calibration

A New Formula for Energy Spectrum of Sputtered Atoms Due to Low-Energy Light Ions

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