Image Reversal Process Using PR1024MB Photo Resist By KrF Excimer Laser Lithography

Evaluation of deep UV ANR photoresists for 248.4 nm. excimer laser photolithography.

“…These resists are relatively slow with photospeeds of >150 mJ/cm2 and suffer from triangular profiles at thicknesses greater than 0.5 micron. [1,3] It is becoming clear that traditional DQN resists lack the photospeed and transparency for deep UV use.…”