This paper examines the feasibility of locally modifying the interface properties of the gold/silicon system using ballistic electron emission microscopy (BEEM). Distinctly different fabricated features have been observed in BEEM images of the Au/Si interface depending on the polarity of the applied voltage pulses. The discrepancy that exists in the modification behavior on specific samples may reveal that the previously proposed adatom terraces and atomic interdiffusion mechanisms are not sufficient to account for all of the observations here.The extensive applications of metal/semiconductor contact in device technology have attracted widespread interest in studying its structural and electronic properties. Up to now, there have been a number of characterization techniques, such as the commonly used photoelectric, capacitance-voltage and current-voltage methods. However, most of these traditional techniques provide only information based on a spatial average over macroscopic dimensions. With the miniaturization of semiconductor devices, there is a practical need to investigate the interface properties at the nanometer scale.Ballistic electron emission microscopy (BEEM) [1], a technique based on the scanning tunneling microscope (STM), has demonstrated its promising ability to study a variety of metal/semiconductor and semiconductor/semiconductor heterojunction interfaces with unprecedentedly high lateral and energy resolutions. With this unique lateral resolution ability, small inhomogeneous features at interfaces, with sizes down the nanometer scale, can be resolved clearly under appropriate conditions: for example, in detecting the homogeneity of interface electronic properties [2], in observing the patterned SiO 2 layers between Au and Si [3], and in measuring the energy band configuration of the buried InAs quantum dots at the Au/GaAs interface [4].