Abstract:We describe the application of scattering-type near-field optical microscopy to characterize various semiconducting materials using the electron storage ring Metrology Light Source (MLS) as a broadband synchrotron radiation source. For verifying high-resolution imaging and nano-FTIR spectroscopy we performed scans across nanoscale Si-based surface structures. The obtained results demonstrate that a spatial resolution below 40 nm can be achieved, despite the use of a radiation source with an extremely broad emission spectrum. This approach allows not only for the collection of optical information but also enables the acquisition of nearfield spectral data in the mid-infrared range. The high sensitivity for spectroscopic material discrimination using synchrotron radiation is presented by recording near-field spectra from thin films composed of different materials used in semiconductor technology, such as SiO 2 , SiC, Si x N y , and TiO 2 .
©2014 Optical Society of AmericaOCIS codes: (120.0120) Instrumentation, measurement, and metrology; (180.4243) Near-field microscopy; (240.0240) Optics at surfaces; (300.0300) Spectroscopy; (310.6860) Thin films, optical properties. 1248-1262 (2014). 5. S. Kawata and Y. Inouye, "Scanning probe optical microscopy using a metallic probe tip," Ultramicroscopy 57(2-3), 313-317 (1995). 6. F. Zenhausern, Y. Martin, and H. K. Wickramasinghe, "Scanning interferometric apertureless microscopy:
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