Analysis of the influence of spherical aberration from focusing through a dielectric slab in quantitative nonlinear optical susceptibility measurements using thirdharmonic generation. Pillai, R.S.; Brakenhoff, G.J.; Müller, M.
Published in: Optics Express
DOI:10.1364/OPEX.14.000260
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Citation for published version (APA):Pillai, R. S., Brakenhoff, G. J., & Müller, M. (2006). Analysis of the influence of spherical aberration from focusing through a dielectric slab in quantitative nonlinear optical susceptibility measurements using third-harmonic generation. Optics Express, 14(1), 260-269. DOI: 10.1364/OPEX.14.000260
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Disclaimer/Complaints regulationsIf you believe that digital publication of certain material infringes any of your rights or (privacy) interests, please let the Library know, stating your reasons. In case of a legitimate complaint, the Library will make the material inaccessible and/or remove it from the website. Please Ask the Library: http://uba.uva.nl/en/contact, or a letter to: Library of the University of Amsterdam, Secretariat, Singel 425, 1012 WP Amsterdam, The Netherlands. You will be contacted as soon as possible. uva.nl, sreedhar@science.uva.nl, muller@science.uva.nl Abstract: The third-order nonlinear susceptibility (χ (3) ) can be measured quantitatively using third-harmonic generation (THG) from two different interfaces. For the first time it is demonstrated both in experiments and theory that the magnitude of the THG signals from the two interfaces is not only determined by material properties (refractive index and χ (3) ), but also by optical aberrations. It is found that this method of χ (3) determination can be applied without additional correction factors only for focusing conditions with a numerical aperture (NA) ≤ 0.35. The implications for general application of THG in three-dimensional microscopy are discussed.