2018
DOI: 10.1088/1748-0221/13/01/c01034
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Imaging performance of a Timepix detector based on semi-insulating GaAs

Abstract: This work focused on a Timepix chip [1] coupled with a bulk semi-insulating GaAs sensor. The sensor consisted of a matrix of 256 × 256 pixels with a pitch of 55 μm bump-bonded to a Timepix ASIC. The sensor was processed on a 350 μm-thick SI GaAs wafer. We carried out detector adjustment to optimize its performance. This included threshold equalization with setting up parameters of the Timepix chip, such as Ikrum, Pream, Vfbk, and so on. The energy calibration of the GaAs Timepix detector was realized using a 2… Show more

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Cited by 12 publications
(12 citation statements)
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“…Its electrical resistivity and electron mobility were measured to be 9.1 × 10 7 Ωcm and 6285 cm 2 /Vs at 300 K. On the one side, square Ti/Pt Schottky contacts in shape of the pixels (55 × 55 µm) were formed, whereas on the other side, common electrode was made as an Au/Ge/Ni multilayer. These structures, of a 350 µm thickness, were then wafer solder bonded to the Timepix chip to create hybrid pixel detector [7].…”
Section: Gaas Sensor Materialsmentioning
confidence: 99%
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“…Its electrical resistivity and electron mobility were measured to be 9.1 × 10 7 Ωcm and 6285 cm 2 /Vs at 300 K. On the one side, square Ti/Pt Schottky contacts in shape of the pixels (55 × 55 µm) were formed, whereas on the other side, common electrode was made as an Au/Ge/Ni multilayer. These structures, of a 350 µm thickness, were then wafer solder bonded to the Timepix chip to create hybrid pixel detector [7].…”
Section: Gaas Sensor Materialsmentioning
confidence: 99%
“…This is due to irradiation from the back side, through the Timepix chip, as the photons are also attenuated in the aluminium chip holder that is located only at the edges of the active area of the chip, right underneath the Timepix chip which can be seen in figure 6. However, if the bias voltage is set low enough, the inhomogeneities caused by the pixel interferences are absent and the inhomogeneities caused by partial depletion can be suppressed by flat field correction because they are not time dependent [7]. We expect that the homogeneity of the response should significantly improve after the problem with partial depletion in SI GaAs sensors is solved.…”
Section: Flat Field Illumination Responsementioning
confidence: 99%
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“…The size of one pixel was 55 × 55 µm 2 and the total number of pixels in the detector was 256 × 256. Parameters of the detector were published in detail in our previous work [18]. The SI GaAs Timepix detector showed a very good spectrometric performance that was tested using a monoenergetic radiation of 59.5 keV from 241 Am and 24.1 keV and 27.3 keV Kα and Kβ photons from indium fluorescence [19].…”
Section: Detector Parametersmentioning
confidence: 99%
“…Figure 1 shows a distribution of the pixel counts of one taken image of an SI GaAs Timepix camera for a uniform illumination from an X-ray tube. The typical background image was shown in our previous works in which we used the same pixel detector [18,19]. We used the counting mode of the imaging Timepix detector for the measurement.…”
Section: Signal-to-noise Ratiomentioning
confidence: 99%