2001
DOI: 10.1116/1.1412895
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Immersion lithography at 157 nm

Abstract: A primary standard for 157 nm excimer laser measurements AIP Conf.

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Cited by 111 publications
(55 citation statements)
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“…On partially wetting polycarbonate surfaces, we observed rupture and dewetting of the liquid films, a relevant phenomenon for coating technology [14] and immersion lithography [15][16][17]. We determined the density of dry spots as well as the density and size distribution of residual droplets as a function of the minimum film thickness.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…On partially wetting polycarbonate surfaces, we observed rupture and dewetting of the liquid films, a relevant phenomenon for coating technology [14] and immersion lithography [15][16][17]. We determined the density of dry spots as well as the density and size distribution of residual droplets as a function of the minimum film thickness.…”
Section: Discussionmentioning
confidence: 99%
“…Consequently air-jets are employed to initiate the redistribution of liquid in continuous coating of chemically patterned surfaces [14]. In immersion lithography [15][16][17], a photoresist covered silicon wafer is exposed through a layer of water in order to increase the effective numerical aperture of the illumination system. Controlled air-flows are utilized to contain the water meniscus between the objective lens and a partially wetting wafer, which is moving at a relative speed of approximately 1 m/s.…”
Section: Introductionmentioning
confidence: 99%
“…45,46 The overall throughput benefits from a high velocity of the wafer relative to the projection optics. However, above a critical velocity liquid is entrained on the surface, which negatively affects the lithography process.…”
Section: A Application Perspectivesmentioning
confidence: 99%
“…[37][38][39][40][41][42][43][44] Our study is motivated by immersion lithography, where the occurrence of such residual liquid is undesirable. 45,46 In this manuscript, we study the increase of mobility of a stationary contact line on a moving, partially wetting substrate by means of localized infrared (IR) laser irradiation. In Paper I, 69 we presented corresponding experimental results.…”
Section: Numerical Simulations I Introductionmentioning
confidence: 99%