Interest in silicon heterojunction solar cells is growing due to their manufacturing simplicity and record efficiencies. A significant limitation of these devices stems from parasitic absorption in the amorphous silicon layers. This can be mitigated replacing the traditional (p) and (n) doped amorphous silicon selective layers by other materials. While promising results have been achieved using molybdenum oxide (MoOx) as front-side hole-selective layer, charge transport mechanisms in that contact stack have remained elusive and device efficiencies below predictions. By carefully analyzing the influence of the MoOx and intrinsic a-Si:H thicknesses on current-voltage properties, we discuss transport and performance-loss mechanisms. In particular, we find that thinning down the MoOx and (i) a-Si:H layers (down to 4 nm and 6 nm respectively) mitigates parasitic optical sub-bandgap MoOx absorption and drastically enhances charge transport, while still providing excellent passivation and selectivity. High-resolution transmission microscopy reveals that such thin MoOx layer remains continuous and close to a MoO3 stoichiometry in spite of the reactive sputtering and annealing steps involved in the electrode deposition. Based on these insights, a screen-printed device reaching a certified efficiency of 23.5% and a fill factor of 81.8% is demonstrated, bridging the gap with traditional Si-based contacts and demonstrating that dopant-free selective contacts can rival traditional approaches.