2014 21st IEEE International Conference on Electronics, Circuits and Systems (ICECS) 2014
DOI: 10.1109/icecs.2014.7050050
|View full text |Cite
|
Sign up to set email alerts
|

Impact of gate workfunction fluctuation on FinFET standard cells

Abstract: FinFET technology is pointed as the main candidate to replace CMOS bulk process in sub-22nm circuits. Predictive technology and design exploration help to understand major effects of variability sources and their impact on circuit performance and power consumption. In this sense, new design methodologies and new EDA tools must be able to deal with the new fabrication process and variability challenges. This paper presents a predictive evaluation of the impact of workfunction variation in the timing and power o… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1

Citation Types

0
3
0

Year Published

2015
2015
2021
2021

Publication Types

Select...
3
2
1

Relationship

2
4

Authors

Journals

citations
Cited by 19 publications
(3 citation statements)
references
References 13 publications
0
3
0
Order By: Relevance
“…It happens due to the orientation of metal grains that are randomly aligned in the FinFET manufacturing process. So, WFF represents the most significant variation beyond the other parameters [36]. The process variabil- II.…”
Section: Methodsmentioning
confidence: 99%
“…It happens due to the orientation of metal grains that are randomly aligned in the FinFET manufacturing process. So, WFF represents the most significant variation beyond the other parameters [36]. The process variabil- II.…”
Section: Methodsmentioning
confidence: 99%
“…Process variability was taken through 10000 Monte Carlo simulations with the workfunction parameter modeled as a Gaussian function with 3 deviation of 5% from nominal values. In these experiments, only workfunction fluctuation (WFF) is considered because this process parameter has been shown as the main process source of variability in FinFET devices [13,23]. This experiment leaves all other 14nm PTM-MG characteristic values unchanged [26].…”
Section: Process Variability Effectsmentioning
confidence: 98%
“…To the best of our knowledge, the first investigation of the impact of WFF due to process variability analysing timing and power consumption in standard cell library at 20nm FinFET technology was presented in [23]. A complementary work [24] evaluated the PVT variability effects on a set of standard cells from a commercial library, but it only considers the minimum transistor sizing for all transistors and cells, i.e., the number of fins equal to 1 in each device.…”
Section: Related Work and Contribuitionsmentioning
confidence: 99%