2021
DOI: 10.1016/j.optmat.2021.111350
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Impact of target power on the properties of sputtered intrinsic zinc oxide (i-ZnO) thin films and its thickness dependence performance on CISe solar cells

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Cited by 18 publications
(4 citation statements)
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“…Similarly, for IZO, the optimal thickness for high solar cell performance is between 0.04 and 0.1 µm, as reported by experiments 51 , 53 55 , 58 . If the thickness is less than 0.04 µm, it increases the leakage current, while for a thickness greater than 0.1 µm, the series resistance increases and the built-in field reduces, leading to degraded performance 59 61 . Based on material usage and experimental range, we have selected a thickness of 0.05 µm for IZO.…”
Section: Device Structure and Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…Similarly, for IZO, the optimal thickness for high solar cell performance is between 0.04 and 0.1 µm, as reported by experiments 51 , 53 55 , 58 . If the thickness is less than 0.04 µm, it increases the leakage current, while for a thickness greater than 0.1 µm, the series resistance increases and the built-in field reduces, leading to degraded performance 59 61 . Based on material usage and experimental range, we have selected a thickness of 0.05 µm for IZO.…”
Section: Device Structure and Methodsmentioning
confidence: 99%
“…Based on material usage and experimental range, we have selected a thickness of 0.05 µm for IZO. Likewise, the other material parameters of AZO and IZO were adapted from the experiments 57 , 61 . The important parameters of other layers such as buffers, Ag 2 BaTiSe 4 and MoSe 2 were tuned to discover their optimum range and understand their influence on the solar cell performance.…”
Section: Device Structure and Methodsmentioning
confidence: 99%
“…This innovative process incorporates spin-coating deposition technology, enabling the creation of oxide thin films under ambient temperature and pressure conditions. This approach notably lowers both the production costs and the time required for processing [24,25]. Furthermore, given the study's reliance on an optical inspection method, there is a deliberate effort to increase the thickness of the film.…”
Section: Thin Film Preparationmentioning
confidence: 99%
“…Additionally, a 50 nmthick buffer layer of cadmium sulfide (CdS) was produced, employing a chemical bath technique [21]. The transparent conductive oxide (TCO) layer comprised two sequential layers: firstly, a 50 nm-thick intrinsic zinc oxide (i-ZnO) layer, succeeded by a 100 nm-thick layer of aluminum-doped zinc oxide (ZnO: Al) [22]. Finally, the front contact was established by depositing a Ni/Al metallic contact through e-beam evaporation.…”
Section: Device Fabricationmentioning
confidence: 99%