Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

Francone, Achille; Iojoiu, Cristina; Poulain, Christophe; Lombard, Christian; Pépin-Donat, Brigitte; Boussey, J.; Zelsmann, M.

doi:10.1116/1.3501339

Cited by 11 publications

(4 citation statements)

References 17 publications

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“…29,30 The durability of these SAMs limits the efficiency. 32,33 One attractive route for replica molding is fluorinated organic-inorganic materials. DeSimone et al designed a photocurable fluorinated organic-inorganic acrylate-based (Fhybrimers) system as an alternative to PDMS for soft lithography applications.…”

Section: Introductionmentioning

confidence: 99%

A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

et al. 2012

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Functional polyhedral oligomeric silsesquioxane (POSS)-based materials have been developed as an ideal material with high performance for nanoimprint lithography (NIL). A novel fluorinated hybrid resist as a soft mold for NIL, based on thiol-ene photopolymerization, was precisely designed and synthesized and is comprised of fluorinated mercaptopropyl polyhedral oligomeric silsesquioxane (POSS-F-SH) and a diluted crosslinker (2,2,3,3,4,4,5, DCFA 4 ). The obtained fluorinated hybrid resists possess a variety of characteristics desirable for UV-NIL, including low viscosity (16-239 cP), a low bulk volumetric shrinkage (4.8-7.5%) and a good resistance to oxygen inhibition. The cross-linked hybrid resins exhibited high transparency to UV light and resistance to organic solvents. As a soft mold, the excellent mechanical property (Young's modulus: 0.31-1.56 GPa) and low surface energy (14-20.4 mJ m À2 ) of the fluorinated polymers provide a clean mold release without fracture or deformation of the embossed structures. The thermally stability (T d > 300 C) render them capable of being used for both UV and thermal NIL duplication processes. The resultant soft mold exhibited a high resolution patterning capacity with feature sizes in the range of 200 nm to several microns. The economic efficiency of the mold fabrication, as well as the high durability and excellent releasing properties, could be quite valuable in NIL for the high-throughput fabrication of nano-devices.

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Section: Introductionmentioning

confidence: 99%

A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

et al. 2012

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“…[7][8][9][10][11] On the other hand, evaluation of the materials or processes for template release has been reported. [12][13][14][15][16][17][18][19][20] Also, several analyses of the defect factors or mechanisms have been carried out by experiments and simulation works. [21][22][23][24][25][26][27][28] We have conducted the computational analysis of the basic mechanisms of the template release process and clarified the template separation mechanisms on the basis of the critical stress model and fracture mechanics model.…”

Section: Introductionmentioning

confidence: 99%

Computational study of the effect of side wall quality of the template on release force in nanoimprint lithography

Tochino

Uemura

Michałowski

et al. 2015

Jpn. J. Appl. Phys.

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A template release force is one of the important factors for a low-defect template release process in nanoimprint lithography. In this work, the origin of the template release force is investigated by computational study of side wall quality characteristics such as the critical separation forces between the template and the resist interface, and the slope angle of the side wall. The critical separation forces in the normal and shear directions, which are related to adhesion and friction characteristics are experimentally evaluated for the computational study. The computational results show that the shear separation force, which is related to the static friction between the template surface and the resist, strongly affects the release force characteristics. On the other hand, the side wall slope angle also affects the template release force above the critical side wall slope angle. The computational results show good agreement with experimental results.

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“…However, it is well known that the ASL deteriorates with repeated nanoimprinting. [18][19][20][21][22][23][24][25][26][27] An effective solution to the mold release problem is the use of a resin with release properties. Some of the fluorinated substances, when added in small amounts to a resin, reduce the demolding force and increase the mold lifetime because they segregate on the resin surface.…”

Section: Introductionmentioning

confidence: 99%

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

Oyama

Okada

Iyoshi

et al. 2014

Jpn. J. Appl. Phys.

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The mold-and antisticking-layer-lifetime improvement is required in nanoimprint lithography. One of the effective methods for such improvement is the use of a resin with release properties. To induce the release properties, fluorosurfactants are added to a nanoimprint resin. The compatibility of fluorosurfactants with resins is an important factor because it affects the segregation of fluorosurfactants. We added two types of fluorosurfactants to an ultrathin UV nanoimprint resin of about 20 nm thickness; one is compatible, and the other is non compatible with the resin. Then, we evaluated the fluorosurfactant depth distribution in an ultrathin resin film by X-ray photoelectron spectroscopy. Contrary to our expectation, both types of fluorosurfactants were segregated on the resin surface. Furthermore, it was confirmed by atomic force microscopy that the non compatible fluorosurfactant agglutinates on the resin surface containing a high additive amount was contained in the resin.

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Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

Cited by 11 publications

References 17 publications

A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

Computational study of the effect of side wall quality of the template on release force in nanoimprint lithography

Evaluation of fluorosurfactant distribution in ultrathin UV nanoimprint resin by X-ray photoelectron spectroscopy

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